Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

  Anderson, Virginia R ^a   Cavanagh, Andrew S ^a   Abdulagatov, Aziz I ^a   Gibbs, Zachary M ^b   George, Steven M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b University of Colorado at Boulder   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED STUDIES; GASEOUS REACTION PRODUCTS; IN-SITU TRANSMISSION; QUADRUPOLE MASS SPECTROMETRY; TITANIUM TETRACHLORIDES; TITANIUM TETRAISOPROPOXIDE; X-RAY PHOTOELECTRONS; X-RAY REFLECTIVITY ANALYSIS;

DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH RATE; HYDRIDES; IN SITU PROCESSING; MASS SPECTROMETRY; OXIDANTS; OXIDATION; REACTION PRODUCTS; SUBSTRATES; SURFACE CHEMISTRY; SURFACE REACTIONS; TITANIUM; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84891793452     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4839015     Document Type: Article

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