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Volumn 19, Issue 4, 2009, Pages 454-462
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Non-aqueous sol-gel routes applied to atomic layer deposition of oxides
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC PHYSICS;
ATOMS;
COLLOIDS;
GELATION;
GELS;
GROWTH (MATERIALS);
METALLIC COMPOUNDS;
MOLECULAR BEAM EPITAXY;
PHYSICAL VAPOR DEPOSITION;
SOL-GEL PROCESS;
SOL-GELS;
SOLIDS;
SOLS;
SURFACE REACTIONS;
THIN FILM DEVICES;
THIN FILMS;
ANALYTICAL TECHNIQUES;
AQUEOUS SOLS;
ASSISTED DEPOSITIONS;
ATOMIC LAYER DEPOSITION (ALD;
ATOMIC LAYERS;
ATOMIC SCALES;
FILM FORMATIONS;
GROWTH STEPS;
IN-SITU;
METAL OXIDES;
RECENT DEVELOPMENTS;
FILM GROWTH;
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EID: 58149520253
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/b806215c Document Type: Article |
Times cited : (39)
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References (83)
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