-
1
-
-
0002572435
-
-
10.1016/0040-6090(92)90874-B
-
T. Suntola, Thin Solid Films 216, 84 (1992). 10.1016/0040-6090(92)90874-B
-
(1992)
Thin Solid Films
, vol.216
, pp. 84
-
-
Suntola, T.1
-
2
-
-
0037156103
-
-
10.1016/S0040-6090(02)00117-7
-
M. Leskela and M. Ritala, Thin Solid Films 409, 138 (2002). 10.1016/S0040-6090(02)00117-7
-
(2002)
Thin Solid Films
, vol.409
, pp. 138
-
-
Leskela, M.1
Ritala, M.2
-
3
-
-
21744444606
-
-
10.1063/1.1940727
-
R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005). 10.1063/1.1940727
-
(2005)
J. Appl. Phys.
, vol.97
, pp. 121301
-
-
Puurunen, R.L.1
-
4
-
-
75649140552
-
-
10.1021/cr900056b
-
S. M. George, Chem. Rev. 110, 111 (2010). 10.1021/cr900056b
-
(2010)
Chem. Rev.
, vol.110
, pp. 111
-
-
George, S.M.1
-
6
-
-
0035342047
-
-
10.1016/S0040-6090(01)00762-3
-
J. W. Elam, C. E. Nelson, R. K. Grubbs, and S. M. George, Thin Solid Films 386, 41 (2001). 10.1016/S0040-6090(01)00762-3
-
(2001)
Thin Solid Films
, vol.386
, pp. 41
-
-
Elam, J.W.1
Nelson, C.E.2
Grubbs, R.K.3
George, S.M.4
-
7
-
-
23044522146
-
-
10.1116/1.1305809
-
S. M. Rossnagel, A. Sherman, and F. Turner, J. Vac. Sci. Technol. B 18 (4), 2016 (2000). 10.1116/1.1305809
-
(2000)
J. Vac. Sci. Technol. B
, vol.18
, Issue.4
, pp. 2016
-
-
Rossnagel, S.M.1
Sherman, A.2
Turner, F.3
-
8
-
-
0038708429
-
-
10.1021/cm021333t
-
T. Aaltonen, M. Ritala, T. Sajavaara, J. Keinonen, and M. Leskela, Chem. Mater. 15, 1924 (2003). 10.1021/cm021333t
-
(2003)
Chem. Mater.
, vol.15
, pp. 1924
-
-
Aaltonen, T.1
Ritala, M.2
Sajavaara, T.3
Keinonen, J.4
Leskela, M.5
-
9
-
-
0000224982
-
-
10.1149/1.1381389
-
M. Hiratani, T. Nabatame, Y. Matsui, K. Imagawa, and S. Kimura, J. Electrochem. Soc. 148 (8), C524 (2001). 10.1149/1.1381389
-
(2001)
J. Electrochem. Soc.
, vol.148
, Issue.8
, pp. 524
-
-
Hiratani, M.1
Nabatame, T.2
Matsui, Y.3
Imagawa, K.4
Kimura, S.5
-
10
-
-
77954343890
-
-
10.1088/0268-1242/24/12/125013
-
C. Henkel, S. Abermann, O. Bethge, and E. Bertagnolli, Semicond. Sci. Technol. 24, 125013 (2009). 10.1088/0268-1242/24/12/125013
-
(2009)
Semicond. Sci. Technol.
, vol.24
, pp. 125013
-
-
Henkel, C.1
Abermann, S.2
Bethge, O.3
Bertagnolli, E.4
-
11
-
-
79952305890
-
-
10.1021/jp111180e
-
I. J. Hsu, D. A. Hansgen, B. E. McCandless, B. G. Willis, and J. G. Chen, J. Phys. Chem. C 115, 3709 (2011). 10.1021/jp111180e
-
(2011)
J. Phys. Chem. C
, vol.115
, pp. 3709
-
-
Hsu, I.J.1
Hansgen, D.A.2
McCandless, B.E.3
Willis, B.G.4
Chen, J.G.5
-
12
-
-
67650470258
-
-
10.1063/1.3176946
-
W. M. M. Kessels, H. C. M. Knoops, S. A. F. Dielissen, A. J. M. Mackus, and M. C. M. can de Sanden, Appl. Phys. Lett. 95, 013114 (2009). 10.1063/1.3176946
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 013114
-
-
Kessels, W.M.M.1
Knoops, H.C.M.2
Dielissen, S.A.F.3
Mackus, A.J.M.4
Can De Sanden, M.C.M.5
-
13
-
-
67650392153
-
-
10.1149/1.3125876
-
H. C. M. Knoops, A. J. M. Mackus, M. E. Donders, M. C. M. van de Sanden, P. H. L. Notten, and W. M. M. Kessels, Electrochem. Solid State Lett. 12 (7), G34 (2009). 10.1149/1.3125876
-
(2009)
Electrochem. Solid State Lett.
, vol.12
, Issue.7
, pp. 34
-
-
Knoops, H.C.M.1
Mackus, A.J.M.2
Donders, M.E.3
Van De Sanden, M.C.M.4
Notten, P.H.L.5
Kessels, W.M.M.6
-
14
-
-
79955727920
-
-
10.1063/1.3555091
-
L. Baker, A. S. Cavanagh, D. Seghete, S. M. George, A. J. M. Mackus, V. M. M. Kessels, Z. Y. Liu, and F. T. Wagner, J. Appl. Phys. 109, 084333 (2011). 10.1063/1.3555091
-
(2011)
J. Appl. Phys.
, vol.109
, pp. 084333
-
-
Baker, L.1
Cavanagh, A.S.2
Seghete, D.3
George, S.M.4
Mackus, A.J.M.5
Kessels, V.M.M.6
Liu, Z.Y.7
Wagner, F.T.8
-
15
-
-
77953014672
-
-
10.1021/jp911178m
-
W. Setthapun, W. D. Williams, S. M. Kim, H. Feng, J. W. Elam, F. A. Rabuffetti, K. R. Poeppelmeier, P. C. Stair, E. A. Stach, F. H. Ribeiro, J. T. Miller, and C. L. Marshall, J. Phys. Chem. C 114, 9758 (2010) 10.1021/jp911178m.
-
(2010)
J. Phys. Chem. C
, vol.114
, pp. 9758
-
-
Setthapun, W.1
Williams, W.D.2
Kim, S.M.3
Feng, H.4
Elam, J.W.5
Rabuffetti, F.A.6
Poeppelmeier, K.R.7
Stair, P.C.8
Stach, E.A.9
Ribeiro, F.H.10
Miller, J.T.11
Marshall, C.L.12
-
17
-
-
82555167452
-
-
10.1063/1.3661163
-
Z. Feng, S. T. Christensen, J. W. Elam, B. Lee, M. C. Hersam, and M. J. Bedzyk, J. Appl. Phys. 110, 102202 (2011). 10.1063/1.3661163
-
(2011)
J. Appl. Phys.
, vol.110
, pp. 102202
-
-
Feng, Z.1
Christensen, S.T.2
Elam, J.W.3
Lee, B.4
Hersam, M.C.5
Bedzyk, M.J.6
-
18
-
-
84866309625
-
-
10.1063/1.4749819
-
L. Baker, A. S. Cavanagh, J. Yin, S. M. George, A. Kongkanand, and F. T. Wagner, Appl. Phys. Lett. 101, 111601 (2012). 10.1063/1.4749819
-
(2012)
Appl. Phys. Lett.
, vol.101
, pp. 111601
-
-
Baker, L.1
Cavanagh, A.S.2
Yin, J.3
George, S.M.4
Kongkanand, A.5
Wagner, F.T.6
-
21
-
-
77954776297
-
-
10.1007/s11837-010-0057-z
-
S. T. Picraux, S. Dayeh, P. Manandhar, D. Perea, and S. Choi, JOM 62 (4), 35 (2010). 10.1007/s11837-010-0057-z
-
(2010)
JOM
, vol.62
, Issue.4
, pp. 35
-
-
Picraux, S.T.1
Dayeh, S.2
Manandhar, P.3
Perea, D.4
Choi, S.5
-
22
-
-
34250375324
-
-
10.1557/jmr.2007.0152
-
Y. Zhu, K. A. Dunn, and A. E. Kaloyeros, J. Mater. Res. 22 (5), 1292 (2007). 10.1557/jmr.2007.0152
-
(2007)
J. Mater. Res.
, vol.22
, Issue.5
, pp. 1292
-
-
Zhu, Y.1
Dunn, K.A.2
Kaloyeros, A.E.3
-
23
-
-
69549120234
-
-
10.1063/1.3213545
-
C. Cheng, J. Hennessy, D. Antoniadis, and E. A. Fitzgerald, Appl. Phys. Lett. 95, 082106 (2009). 10.1063/1.3213545
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 082106
-
-
Cheng, C.1
Hennessy, J.2
Antoniadis, D.3
Fitzgerald, E.A.4
-
25
-
-
84877295155
-
-
10.1021/nl3022434
-
S. A. Dayeh, W. Tang, H. Zheng, J. Wang, N. H. Mack, G. Swadener, K. L. Kavanagh, J. Y. Huang, K.-N. Tu, and S. T. Picraux, Nano Lett. 13, 1869 (2013). 10.1021/nl3022434
-
(2013)
Nano Lett.
, vol.13
, pp. 1869
-
-
Dayeh, S.A.1
Tang, W.2
Zheng, H.3
Wang, J.4
Mack, N.H.5
Swadener, G.6
Kavanagh, K.L.7
Huang, J.Y.8
Tu, K.-N.9
Picraux, S.T.10
-
26
-
-
33745327664
-
-
10.1038/nature04796
-
J. Xiang, W. Lu, Y. Hu, Y. Wu, H. Yan, and C. M. Lieber, Nature 441 (7092), 489 (2006). 10.1038/nature04796
-
(2006)
Nature
, vol.441
, Issue.7092
, pp. 489
-
-
Xiang, J.1
Lu, W.2
Hu, Y.3
Wu, Y.4
Yan, H.5
Lieber, C.M.6
-
27
-
-
79955408966
-
-
10.1063/1.3574537
-
S. A. Dayeh, A. V. Gin, and S. T. Picraux, Appl. Phys. Lett. 98 (16), 163112 (2011). 10.1063/1.3574537
-
(2011)
Appl. Phys. Lett.
, vol.98
, Issue.16
, pp. 163112
-
-
Dayeh, S.A.1
Gin, A.V.2
Picraux, S.T.3
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