Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques

Applied Physics Letters

Volumn 101, Issue 11, 2012, Pages

  Baker, L ^a   Cavanagh, A S ^a   Yin, J ^a   George, S M ^a,b   Kongkanand, A ^c   Wagner, F T ^c  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

^c GENERAL MOTORS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION LAYER; ATOMIC LAYER; HIGH SURFACE ENERGY; LAYER-BY-LAYER GROWTH; PLATINUM FILMS; PT FILMS; RAPID NUCLEATION; ULTRA-THIN; X RAY REFLECTIVITY; X-RAY PHOTOELECTRONS;

ADHESION; FILM GROWTH; INTERFACIAL ENERGY; PLATINUM; PRECIOUS METALS; TUNGSTEN; ULTRATHIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 84866309625     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4749819     Document Type: Article

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