-
1
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, vol. 432, no. 7016, pp. 488-492, Nov. 2004. (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
2
-
-
33748795083
-
High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering
-
Sep.
-
H. Yabuta, M. Sano, K. Abe, T. Aiba, T. Den, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono, "High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering," Appl. Phys. Lett., vol. 89, no. 11, pp. 112123-1-112123-3, Sep. 2006.
-
(2006)
Appl. Phys. Lett.
, vol.89
, Issue.11
, pp. 1121231-1121233
-
-
Yabuta, H.1
Sano, M.2
Abe, K.3
Aiba, T.4
Den, T.5
Kumomi, H.6
Nomura, K.7
Kamiya, T.8
Hosono, H.9
-
3
-
-
38549145327
-
Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors
-
Jan.
-
A. Suresh and J. F. Muth, "Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors," Appl. Phys. Lett., vol. 92, no. 3, pp. 033502-1-033502-3, Jan. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.3
, pp. 0335021-0335023
-
-
Suresh, A.1
Muth, J.F.2
-
4
-
-
79952855765
-
Analysis of bias stress instability in amorphous InGaZnO thin-film transistors
-
Mar.
-
E. N. Cho, J. H. Kang, C. E. Kim, P. Moon, and I. Yun, "Analysis of bias stress instability in amorphous InGaZnO thin-film transistors," IEEE Trans. Device Mater. Rel., vol. 11, no. 1, pp. 112-117, Mar. 2011.
-
(2011)
IEEE Trans. Device Mater. Rel.
, vol.11
, Issue.1
, pp. 112-117
-
-
Cho, E.N.1
Kang, J.H.2
Kim, C.E.3
Moon, P.4
Yun, I.5
-
5
-
-
69049093543
-
Charge trapping and detrapping characteristics in amorphous InGaZnO TFTs under static and dynamic stresses
-
Jan.
-
I.-T. Cho, J.-M. Lee, J.-H. Lee, and H.-I. Kwon, "Charge trapping and detrapping characteristics in amorphous InGaZnO TFTs under static and dynamic stresses," Semicond. Sci. Technol., vol. 24, no. 1, p. 015013, Jan. 2009.
-
(2009)
Semicond. Sci. Technol.
, vol.24
, Issue.1
, pp. 015013
-
-
Cho, I.-T.1
Lee, J.-M.2
Lee, J.-H.3
Kwon, H.-I.4
-
6
-
-
69049119241
-
Gate-bias stress in amorphous oxide semiconductors thin-film transistors
-
Aug.
-
M. E. Lopes, H. L. Gomes, M. C. R. Medeiros, P. Barquinha, L. Pereira, E. Fortunato, R. Martins, and I. Ferreira, "Gate-bias stress in amorphous oxide semiconductors thin-film transistors," Appl. Phys. Lett., vol. 95, no. 6, pp. 063502-1-063502-3, Aug. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.6
, pp. 0635021-0635023
-
-
Lopes, M.E.1
Gomes, H.L.2
Medeiros, M.C.R.3
Barquinha, P.4
Pereira, L.5
Fortunato, E.6
Martins, R.7
Ferreira, I.8
-
7
-
-
84866733720
-
Effects of alternating pulse bias stress on amorphous InGaZnO thin film transistors
-
May
-
S. Park, E. N. Cho, and I. Yun, "Effects of alternating pulse bias stress on amorphous InGaZnO thin film transistors," ECS Trans., vol. 45, no. 7, pp. 111-117, May 2012.
-
(2012)
ECS Trans.
, vol.45
, Issue.7
, pp. 111-117
-
-
Park, S.1
Cho, E.N.2
Yun, I.3
-
8
-
-
84866742404
-
Threshold voltage shift prediction for gate bias stress on amorphous InGaZnO thin film transistors
-
Sep.-Oct.
-
S. Park, E. N. Cho, and I. Yun, "Threshold voltage shift prediction for gate bias stress on amorphous InGaZnO thin film transistors," Microelectron. Rel., vol. 52, nos. 9-10, pp. 2215-2219, Sep.-Oct. 2012.
-
(2012)
Microelectron. Rel.
, vol.52
, Issue.9-10
, pp. 2215-2219
-
-
Park, S.1
Cho, E.N.2
Yun, I.3
-
9
-
-
79957544626
-
Contact resistance dependent scalingdown behavior of amorphous InGaZnO thin-film transistors
-
Jul.
-
E. N. Cho, J. H. Kang, and I. Yun, "Contact resistance dependent scalingdown behavior of amorphous InGaZnO thin-film transistors," Current Appl. Phys., vol. 11, no. 4, pp. 1015-1019, Jul. 2011.
-
(2011)
Current Appl. Phys.
, vol.11
, Issue.4
, pp. 1015-1019
-
-
Cho, E.N.1
Kang, J.H.2
Yun, I.3
-
10
-
-
0038343609
-
Analysis of narrow width effects in polycrystalline silicon thin film transistors
-
Jan.
-
H.-W. Zan, T.-C. Chang, P.-S. Shih, D.-Z. Peng, T.-Y. Huang, and C.-Y. Chang, "Analysis of narrow width effects in polycrystalline silicon thin film transistors," Jpn. J. Appl. Phys., vol. 42, no. 1, pp. 28-32, Jan. 2003.
-
(2003)
Jpn. J. Appl. Phys.
, vol.42
, Issue.1
, pp. 28-32
-
-
Zan, H.-W.1
Chang, T.-C.2
Shih, P.-S.3
Peng, D.-Z.4
Huang, T.-Y.5
Chang, C.-Y.6
-
11
-
-
41649120938
-
Modeling of amorphous InGaZnO4 thin film transistors and their subgap density of states
-
Apr.
-
H.-H. Hsieh, T. Kamiya, K. Nomura, H. Hosono, and C.-C. Wu, "Modeling of amorphous InGaZnO4 thin film transistors and their subgap density of states," Appl. Phys. Lett., vol. 92, no. 13, pp. 133503-1-133503-3, Apr. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.13
, pp. 1335031-1335033
-
-
Hsieh, H.-H.1
Kamiya, T.2
Nomura, K.3
Hosono, H.4
Wu, C.-C.5
-
12
-
-
84863312310
-
Investigation on the relationship between channel resistance and subgap density of states of amorphous InGaZnO thin film transistors
-
Sep.
-
S. Park, E. N. Cho, and I. Yun, "Investigation on the relationship between channel resistance and subgap density of states of amorphous InGaZnO thin film transistors," Solid State Electron., vol. 75, pp. 93-96, Sep. 2012.
-
(2012)
Solid State Electron.
, vol.75
, pp. 93-96
-
-
Park, S.1
Cho, E.N.2
Yun, I.3
-
13
-
-
67650483313
-
Flexible full color organic light-emitting diode display on polyimide plastic substrate driven by amorphous indium gallium zinc oxide thin-film transistors
-
Jul.
-
J.-S. Park, T.-W. Kim, D. Stryakhilev, J.-S. Lee, S.-G. An, Y.-S. Pyo, D.-B. Lee, Y. G. Mo, D.-U. Jin, and H. K. Chung, "Flexible full color organic light-emitting diode display on polyimide plastic substrate driven by amorphous indium gallium zinc oxide thin-film transistors," Appl. Phys. Lett., vol. 95, no. 1, pp. 013503-1-013503-3, Jul. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.1
, pp. 0135031-0135033
-
-
Park, J.-S.1
Kim, T.-W.2
Stryakhilev, D.3
Lee, J.-S.4
An, S.-G.5
Pyo, Y.-S.6
Lee, D.-B.7
Mo, Y.G.8
Jin, D.-U.9
Chung, H.K.10
-
14
-
-
84887047036
-
-
Santa Clara, CA, USA: AEA
-
R. C. Whaley, ATLAS. Santa Clara, CA, USA: AEA, 2008.
-
(2008)
ATLAS
-
-
Whaley, R.C.1
-
15
-
-
21544438388
-
Charge trapping instabilities in amorphous siliconsilicon nitride thin-film transistors
-
Sep.
-
M. J. Powell, "Charge trapping instabilities in amorphous siliconsilicon nitride thin-film transistors," Appl. Phys. Lett., vol. 43, no. 6, pp. 597-599, Sep. 1983.
-
(1983)
Appl. Phys. Lett.
, vol.43
, Issue.6
, pp. 597-599
-
-
Powell, M.J.1
-
16
-
-
36449009572
-
Bias-stress-induced stretched-exponential time dependence of charge injection and trapping in amorphous thinfilm transistors
-
Dec.
-
F. R. Libsch and J. Kanicki, "Bias-stress-induced stretched-exponential time dependence of charge injection and trapping in amorphous thinfilm transistors," Appl. Phys. Lett., vol. 62, no. 11, pp. 1286-1-1286-3, Dec. 1993.
-
(1993)
Appl. Phys. Lett.
, vol.62
, Issue.11
, pp. 12861-12863
-
-
Libsch, F.R.1
Kanicki, J.2
-
17
-
-
66749143525
-
Comparative study of electrical instabilities in topgate InGaZnO thin film transistors with Al2O3 and Al2O3/SiNx gate dielectrics
-
Jun.
-
J.-M. Lee, I.-T. Cho, J.-H. Lee, W.-S. Cheong, C.-S. Hwang, and H.-I. Kwon, "Comparative study of electrical instabilities in topgate InGaZnO thin film transistors with Al2O3 and Al2O3/SiNx gate dielectrics," Appl. Phys. Lett., vol. 94, no. 22, pp. 222112-1-222112-3, Jun. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.94
, Issue.22
, pp. 2221121-2221123
-
-
Lee, J.-M.1
Cho, I.-T.2
Lee, J.-H.3
Cheong, W.-S.4
Hwang, C.-S.5
Kwon, H.-I.6
-
19
-
-
80052926528
-
Effects of channel thickness variation on bias stress instability of InGaZnO thin-film transistors
-
Sep.-Nov.
-
E. N. Cho, J. H. Kang, and I. Yun, "Effects of channel thickness variation on bias stress instability of InGaZnO thin-film transistors," Microelectron. Rel., vol. 51, nos. 9-11, pp. 1792-1795, Sep.-Nov. 2011.
-
(2011)
Microelectron. Rel.
, vol.51
, Issue.9-11
, pp. 1792-1795
-
-
Cho, E.N.1
Kang, J.H.2
Yun, I.3
-
20
-
-
33746606543
-
Scaling behavior of ZnO transparent thin-film transistors
-
Jul.
-
H.-H. Hsieh and C.-C. Wu, "Scaling behavior of ZnO transparent thin-film transistors," Appl. Phys. Lett., vol. 89, no. 4, pp. 041109-1-041109-3, Jul. 2006.
-
(2006)
Appl. Phys. Lett.
, vol.89
, Issue.4
, pp. 0411091-0411093
-
-
Hsieh, H.-H.1
Wu, C.-C.2
-
21
-
-
70450210334
-
Electrical instability of RF sputter amorphous In-Ga-Zn-O thin-film transistors
-
Dec.
-
T.-C. Fung, K. Abe, H. Kumomi, and J. Kanicki, "Electrical instability of RF sputter amorphous In-Ga-Zn-O thin-film transistors," J. Display Technol., vol. 5, no. 12, pp. 452-461, Dec. 2009.
-
(2009)
J. Display Technol.
, vol.5
, Issue.12
, pp. 452-461
-
-
Fung, T.-C.1
Abe, K.2
Kumomi, H.3
Kanicki, J.4
-
23
-
-
84861712573
-
Performance of 5-nm a-IGZO TFTs with various channel lengths and an etch stopper manufactured by back UV exposure
-
Jun
-
M. Mativenga, D. Geng, J. H. Chang, T. J. Tredwell, and J. Jang, "Performance of 5-nm a-IGZO TFTs with various channel lengths and an etch stopper manufactured by back UV exposure," IEEE Electron Device Lett., vol. 33, no. 6, pp. 824-826, Jun. 2012.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.6
, pp. 824-826
-
-
Mativenga, M.1
Geng, D.2
Chang, J.H.3
Tredwell, T.J.4
Jang, J.5
-
24
-
-
0029516165
-
Analytical models for amorphous-silicon and polysilicon thin-film transistors for high-definition-display technology
-
Dec.
-
M. S. Shur, M. D. Jacunski, H. C. Slade, and M. Hack, "Analytical models for amorphous-silicon and polysilicon thin-film transistors for high-definition-display technology," J. Soc. Inf. Display, vol. 3, no. 4, pp. 223-236, Dec. 1995.
-
(1995)
J. Soc. Inf. Display
, vol.3
, Issue.4
, pp. 223-236
-
-
Shur, M.S.1
Jacunski, M.D.2
Slade, H.C.3
Hack, M.4
-
25
-
-
33747291818
-
Threshold voltage, field effect mobility, and gate-to-channel capacitance in polysilicon TFT'S
-
Sep.
-
M. D. Jacunski, M. S. Shur, and M. Hack, "Threshold voltage, field effect mobility, and gate-to-channel capacitance in polysilicon TFT'S," IEEE Trans. Electron Devices, vol. 43, no. 9, pp. 1433-1440, Sep. 1996.
-
(1996)
IEEE Trans. Electron Devices
, vol.43
, Issue.9
, pp. 1433-1440
-
-
Jacunski, M.D.1
Shur, M.S.2
Hack, M.3
-
26
-
-
84655167983
-
Impact of oxygen flow rate on the instability under positive bias stresses in DC-Sputtered amorphous InGaZnO thinfilm transistors
-
Jan.
-
S. Kim, Y. W. Jeon, Y. Kim, D. Kong, H. K. Jung, M.-K. Bae, J.-H. Lee, B. D. Ahn, S. Y. Park, J.-H. Park, J. Park, H.-I. Kwon, D. M. Kim, and D. H. Kim, "Impact of oxygen flow rate on the instability under positive bias stresses in DC-Sputtered amorphous InGaZnO thinfilm transistors," IEEE Electron Device Lett., vol. 33, no. 1, pp. 62-64, Jan. 2012.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.1
, pp. 62-64
-
-
Kim, S.1
Jeon, Y.W.2
Kim, Y.3
Kong, D.4
Jung, H.K.5
Bae, M.-K.6
Lee, J.-H.7
Ahn, B.D.8
Park, S.Y.9
Park, J.-H.10
Park, J.11
Kwon, H.-I.12
Kim, D.M.13
Kim, D.H.14
-
27
-
-
79551552419
-
Instabilities in amorphous oxide semiconductor thin-film transistors
-
Dec.
-
J. F. Conley, "Instabilities in amorphous oxide semiconductor thin-film transistors," IEEE Trans. Device Mater. Rel., vol. 10, no. 4, pp. 460-475, Dec. 2010.
-
(2010)
IEEE Trans. Device Mater. Rel.
, vol.10
, Issue.4
, pp. 460-475
-
-
Conley, J.F.1
|