-
1
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, vol. 432, no. 7016, pp. 488-492, Nov. 2004. (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
2
-
-
34249697083
-
X etch stopper
-
May
-
X etch stopper," Appl. Phys. Lett., vol. 90, no. 21, p. 212114, May 2007.
-
(2007)
Appl. Phys. Lett.
, vol.90
, Issue.21
, pp. 212114
-
-
Kim, M.K.1
Jeong, J.H.2
Lee, H.J.3
Ahn, T.K.4
Shin, H.S.5
Park, J.S.6
Jeong, J.K.7
Mo, Y.G.8
Kim, H.D.9
-
3
-
-
0037415828
-
ZnO-based transparent thin-film transistors
-
Feb.
-
R. L. Hoffman, B. H. Norris, and J. F. Wager, "ZnO-based transparent thin-film transistors," Appl. Phys. Lett., vol. 82, no. 5, pp. 733-735, Feb. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.82
, Issue.5
, pp. 733-735
-
-
Hoffman, R.L.1
Norris, B.H.2
Wager, J.F.3
-
4
-
-
16244382410
-
Fully transparent ZnO thin-film transistor produced at room temperature
-
DOI 10.1002/adma.200400368
-
E. Fortunato, P. Barquinha, A. Pimentel, A. Goncalves, A. Marques, L. Pereira, and R. Martins, "Fully transparent ZnO thin-film transistor produced at room temperature," Adv. Mater., vol. 17, no. 5, pp. 590-594, Mar. 2005. (Pubitemid 40448713)
-
(2005)
Advanced Materials
, vol.17
, Issue.5
, pp. 590-594
-
-
Fortunato, E.M.C.1
Barquinha, P.M.C.2
Pimentel, A.C.M.B.G.3
Goncalves, A.M.F.4
Marques, A.J.S.5
Pereira, L.M.N.6
Martins, R.F.P.7
-
5
-
-
69049119241
-
Gate-bias stress in amorphous oxide semiconductors thin-film transistors
-
Aug.
-
M. E. Lopes, H. L. Gomes, M. C. Medeiros, P. Barquinha, L. Pereira, E. Fortunato, R. Martins, and I. Ferreira, "Gate-bias stress in amorphous oxide semiconductors thin-film transistors," Appl. Phys. Lett., vol. 95, no. 6, p. 063502, Aug. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.6
, pp. 063502
-
-
Lopes, M.E.1
Gomes, H.L.2
Medeiros, M.C.3
Barquinha, P.4
Pereira, L.5
Fortunato, E.6
Martins, R.7
Ferreira, I.8
-
6
-
-
70450210334
-
Electrical instability of RF sputter amorphous In-Ga-Zn-O thin-film transistors
-
Dec.
-
T.-C. Fung, K. Abe, H. Kumomi, and J. Kanicki, "Electrical instability of RF sputter amorphous In-Ga-Zn-O thin-film transistors," J. Display Technol., vol. 5, no. 12, pp. 452-461, Dec. 2009.
-
(2009)
J. Display Technol.
, vol.5
, Issue.12
, pp. 452-461
-
-
Fung, T.-C.1
Abe, K.2
Kumomi, H.3
Kanicki, J.4
-
7
-
-
38549145327
-
Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors
-
Jan.
-
A. Suresh and J. F. Muth, "Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors," Appl. Phys. Lett., vol. 92, no. 3, p. 033502, Jan. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.3
, pp. 033502
-
-
Suresh, A.1
Muth, J.F.2
-
8
-
-
67650474594
-
Origins of threshold voltage shifts in room-temperature deposited and annealed a-In-Ga-Zn-O thin-film transistors
-
Jul.
-
K. Nomura, T. Kamiya, M. Hirano, and H. Hosono, "Origins of threshold voltage shifts in room-temperature deposited and annealed a-In-Ga-Zn-O thin-film transistors," Appl. Phys. Lett., vol. 95, no. 1, p. 013502, Jul. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.1
, pp. 013502
-
-
Nomura, K.1
Kamiya, T.2
Hirano, M.3
Hosono, H.4
-
9
-
-
59349115938
-
High reliable and manufacturable gallium indium zinc oxide thin-film transistors using the double layers as an active layer
-
Jan.
-
S. I. Kim, J.-S. Park, C. J. Kim, J. C. Park, I. Song, and Y. S. Park, "High reliable and manufacturable gallium indium zinc oxide thin-film transistors using the double layers as an active layer," J. Electrochem. Soc., vol. 156, no. 3, pp. H184-H187, Jan. 2009.
-
(2009)
J. Electrochem. Soc.
, vol.156
, Issue.3
-
-
Kim, S.I.1
Park, J.-S.2
Kim, C.J.3
Park, J.C.4
Song, I.5
Park, Y.S.6
-
10
-
-
67650483313
-
Flexible full color organic light-emitting diode display on polyimide plastic substrate driven by amorphous indium gallium zinc oxide thin-film transistors
-
Jul.
-
J.-S. Park, T.-W. Kim, D. Stryakhilev, J.-S. Lee, S.-G. An, Y.-S. Pyo, D.-B. Lee, Y. G. Mo, D.-U. Jin, and H. K. Chung, "Flexible full color organic light-emitting diode display on polyimide plastic substrate driven by amorphous indium gallium zinc oxide thin-film transistors," Appl. Phys. Lett., vol. 95, no. 1, p. 013503, Jul. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.1
, pp. 013503
-
-
Park, J.-S.1
Kim, T.-W.2
Stryakhilev, D.3
Lee, J.-S.4
An, S.-G.5
Pyo, Y.-S.6
Lee, D.-B.7
Mo, Y.G.8
Jin, D.-U.9
Chung, H.K.10
-
11
-
-
0004022746
-
-
Silvaco Int.Santa Clara CA
-
ATLAS User's Manual, Silvaco Int., Santa Clara, CA, 2008.
-
(2008)
ATLAS User's Manual
-
-
-
12
-
-
41649120938
-
4 thin film transistors and their subgap density of states
-
Mar.
-
4 thin film transistors and their subgap density of states," Appl. Phys. Lett., vol. 92, no. 13, p. 133503, Mar. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.13
, pp. 133503
-
-
Hsieh, H.-H.1
Kamiya, T.2
Nomura, K.3
Hosono, H.4
Wu, C.-C.5
-
13
-
-
55849138008
-
Modeling of amorphous InGaZnO thin-film transistors based on the density of states extracted from the optical response of capacitance-voltage characteristics
-
Nov.
-
K. Jeon, C. Kim, I. Song, J. Park, S. Kim, S. Kim, Y. Park, J.-H. Park, S. Lee, D. M. Kim, and D. H. Kim, "Modeling of amorphous InGaZnO thin-film transistors based on the density of states extracted from the optical response of capacitance-voltage characteristics," Appl. Phys. Lett., vol. 93, no. 18, p. 182102, Nov. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.18
, pp. 182102
-
-
Jeon, K.1
Kim, C.2
Song, I.3
Park, J.4
Kim, S.5
Kim, S.6
Park, Y.7
Park, J.-H.8
Lee, S.9
Kim, D.M.10
Kim, D.H.11
-
14
-
-
51349141239
-
Bias-stress-induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors
-
Sep.
-
J.-M. Lee, I.-T. Cho, J.-H. Lee, and H.-I. Kwon, "Bias-stress- induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors," Appl. Phys. Lett., vol. 93, no. 9, p. 093504, Sep. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.9
, pp. 093504
-
-
Lee, J.-M.1
Cho, I.-T.2
Lee, J.-H.3
Kwon, H.-I.4
-
15
-
-
21544438388
-
Charge trapping instabilities in amorphous silicon-silicon nitride thin-film transistors
-
Sep.
-
M. J. Powell, "Charge trapping instabilities in amorphous silicon-silicon nitride thin-film transistors," Appl. Phys. Lett., vol. 43, no. 6, pp. 597-599, Sep. 1983.
-
(1983)
Appl. Phys. Lett.
, vol.43
, Issue.6
, pp. 597-599
-
-
Powell, M.J.1
-
16
-
-
36449009572
-
Bias-stress-induced stretched-exponential time dependence of charge injection and trapping in amorphous thin-film transistors
-
Mar.
-
F. R. Libsch and J. Kanicki, "Bias-stress-induced stretched-exponential time dependence of charge injection and trapping in amorphous thin-film transistors," Appl. Phys. Lett., vol. 62, no. 11, pp. 1286-1288, Mar. 1993.
-
(1993)
Appl. Phys. Lett.
, vol.62
, Issue.11
, pp. 1286-1288
-
-
Libsch, F.R.1
Kanicki, J.2
-
17
-
-
34248326216
-
Resolution of amorphous silicon thinfilm transistor instability mechanisms using ambipolar transistors
-
Oct.
-
C. van Berkel and M. J. Powell, "Resolution of amorphous silicon thinfilm transistor instability mechanisms using ambipolar transistors," Appl. Phys. Lett., vol. 51, no. 14, pp. 1094-1096, Oct. 1987.
-
(1987)
Appl. Phys. Lett.
, vol.51
, Issue.14
, pp. 1094-1096
-
-
Van Berkel, C.1
Powell, M.J.2
-
18
-
-
0001326503
-
Bias dependence of instability mechanisms in amorphous silicon thinfilm transistors
-
Oct.
-
M. J. Powell, C. van Berkel, I. D. French, and D. H. Nicholls, "Bias dependence of instability mechanisms in amorphous silicon thinfilm transistors," Appl. Phys. Lett., vol. 51, no. 16, pp. 1242-1244, Oct. 1987.
-
(1987)
Appl. Phys. Lett.
, vol.51
, Issue.16
, pp. 1242-1244
-
-
Powell, M.J.1
Van Berkel, C.2
French, I.D.3
Nicholls, D.H.4
-
20
-
-
70450216988
-
Electronic structures above mobility edges in crystalline and amorphous In-Ga-Zn-O: Percolation conduction examined by analytical model
-
Dec.
-
T. Kamiya, K. Nomura, and H. Hosono, "Electronic structures above mobility edges in crystalline and amorphous In-Ga-Zn-O: Percolation conduction examined by analytical model," J. Display Technol., vol. 5, no. 12, pp. 462-467, Dec. 2009.
-
(2009)
J. Display Technol.
, vol.5
, Issue.12
, pp. 462-467
-
-
Kamiya, T.1
Nomura, K.2
Hosono, H.3
|