Atmospheric pressure plasma enhanced chemical vapor deposition of hydrophobic coatings using fluorine-based liquid precursors

Surface and Coatings Technology

Volumn 234, Issue , 2013, Pages 21-32

  Yim, Jacqueline H ^a   Rodriguez Santiago, Victor ^a   Williams, André A ^a   Gougousi, Theodosia ^b   Pappas, Daphne D ^a   Hirvonen, James K ^a  

^a U S ARMY RESEARCH LABORATORY   (United States)

^b UNIVERSITY OF MARYLAND BALTIMORE COUNTY   (United States)

Author keywords

Atmospheric pressure plasma jet (APPJ); Dielectric barrier discharge (DBD); Fluorocarbon; Hydrophobic coating; Organofluorosilane; Plasma enhanced chemical vapor deposition (PECVD)

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; DIELECTRIC BARRIER DISCHARGES; HYDROPHOBIC COATINGS; ORGANOFLUOROSILANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD);

ATOMIC FORCE MICROSCOPY; DEPOSITION; FLUOROCARBONS; HYDROPHOBICITY; MONOMERS; PHOTOELECTRONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; SCANNING ELECTRON MICROSCOPY; SILANES; THIN FILMS; ULTRAHIGH MOLECULAR WEIGHT POLYETHYLENES; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

COATINGS;

EID: 84885419270     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.03.028     Document Type: Article

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