The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3513-3520

  Jiang, Hao ^b   Hong, Lianggou ^b   Venkatasubramanian, N ^c   Grant, John T ^c   Eyink, Kurt ^a   Wiacek, Kevin ^a   Fries Carr, Sandra ^a   Enlow, Jesse ^a   Bunning, Timothy J ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b Materials Sci and Tech Applications LLC   (United States)

^c UNIVERSITY OF DAYTON   (United States)

Author keywords

Dielectric properties; Plasma enhanced chemical vapor deposition (PECVD); Polymer thin films; Structure

Indexed keywords

DIELECTRIC PROPERTIES; ELECTRONIC STRUCTURE; MONOMERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; THIN FILMS;

DOWNSTREAM REGION (DS); OCTAFLUOROCYCLOBUTANE; POLYMER DIELECTRIC FILMS; POLYMER THIN FILMS;

PLASTIC FILMS;

EID: 33846927776     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.126     Document Type: Article

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