Growth of fluorocarbon films by low-pressure dielectric barrier discharge

Plasma Science and Technology

Volumn 10, Issue 1, 2008, Pages 74-77

  Li, Wei ^a,b   Tan, Xiaodong ^b   Liu, Dongping ^a   Liu, Yanhong ^c   Feng, Zhiqing ^a   Chen, Baoxiang ^a  

^a DALIAN NATIONALITIES UNIVERSITY   (China)

^b DALIAN JIAOTONG UNIVERSITY   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Dielectric barrier discharge; Fluorocarbon films; X ray photoelectron spectrometry

Indexed keywords

ANGLE MEASUREMENT; CONTACT ANGLE; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; FILM GROWTH; NATURAL FREQUENCIES; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC BARRIER DISCHARGE; FLUOROCARBON FILMS;

FLUOROCARBONS;

EID: 42549139434     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/10/1/16     Document Type: Article

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