Property of plasma-polymerized fluorocarbon film in relation to CH4/C4F8 ratio and substrate temperature

Sensors and Actuators, A: Physical

Volumn 83, Issue 1, 2000, Pages 179-185

  Matsumoto, Yoshinori ^a   Ishida, Makoto ^b  

^a KEIO UNIVERSITY   (Japan)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; ELECTRIC BREAKDOWN; ELECTROSTATICS; FLUORINE CONTAINING POLYMERS; FLUOROCARBONS; FRACTALS; HYDROPHOBICITY; METHANE; PLASMA POLYMERIZATION; THERMAL EFFECTS; THERMODYNAMIC STABILITY;

TOUCHING TESTS;

PLASTIC FILMS;

EID: 0033749088     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00396-9     Document Type: Article

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