Effects of micromachining processes on electro-osmotic flow mobility of glass surfaces

Micromachines

Volumn 4, Issue 1, 2013, Pages 67-79

  Koga, Yosuke ^a   Kuriyama, Reiko ^a   Sato, Yohei ^a   Hishida, Koichi ^a   Miki, Norihisa ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Dry etching; Electro osmotic flow; Glass; MicroTAS; Nanofluidics; Neutral loop discharge plasma etching; Surface roughness; Wet etching; Zeta potential

Indexed keywords

DEVICE MATERIALS; DISCHARGE PLASMA; ELECTRIC DOUBLE LAYER; ELECTROOSMOTIC FLOW; FABRICATION PROCESS; MANUFACTURING PROCESS; MICROMACHINING PROCESS; MICROTAS;

ATOMIC FORCE MICROSCOPY; DRY ETCHING; ELECTROOSMOSIS; FLUIDIC DEVICES; GLASS; HYDROFLUORIC ACID; PLASMA ETCHING; SURFACE ROUGHNESS; SURFACES; WET ETCHING; ZETA POTENTIAL;

NANOFLUIDICS;

EID: 84885162193     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi4010067     Document Type: Article

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