Embedded nano channels fabricated by non-selective reverse contact UV nanoimprint lithography technique

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 921-924

  Kehagias, N ^a   Chansin, G ^a   Reboud, V ^a   Zelsmann, M ^a,b   Schuster, C ^c   Kubenz, M ^c   Reuther, F ^c   Gruetzner, G ^c   Sotomayor Torres, C M ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b CEA LETI   (France)

^c MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Reverse nanoimprint lithography; Three dimensional nanofabrication

Indexed keywords

EMBEDDED SYSTEMS; NANOTECHNOLOGY; OPTIMIZATION; ULTRAVIOLET RADIATION;

REVERSE CONTACT ULTRAVIOLET NANOIMPRINT LITHOGRAPHY (RUVNIL); REVERSE NANOIMPRINT LITHOGRAPHY; THREE DIMENSIONAL NANOFABRICATION;

NANOIMPRINT LITHOGRAPHY;

EMBEDDING; LITHOGRAPHY; ULTRAVIOLET RADIATION;

EID: 34247618822     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.057     Document Type: Article

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