Application of magnetic neutral loop discharge plasma in deep silica etching

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2936-2940

  Chen, W ^a   Sugita, K ^a   Morikawa, Y ^a  

^a ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; KINETIC ENERGY; LOOP ANTENNAS; MICROELECTROMECHANICAL DEVICES; OPTICAL WAVEGUIDES; PLASMA DENSITY; SCANNING ELECTRON MICROSCOPY; SILICA; SURFACE ROUGHNESS;

NEUTRAL LOOP DISCHARGES (NLD); WIDELY COUPLED PLASMAS (WCP);

PLASMA ETCHING;

EID: 0035508233     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1415355     Document Type: Article

References (7)