Enhancement of rotordynamic performance of high-speed micro-rotors for power MEMS applications by precision deep reactive ion etching

Sensors and Actuators, A: Physical

Volumn 104, Issue 3, 2003, Pages 263-267

  Miki, N ^a   Teo, C J ^a   Ho, L C ^b   Zhang, X ^c  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c BOSTON UNIVERSITY   (United States)

Author keywords

Deep reactive ion etching; Etch uniformity; High speed rotor; Power MEMS; Rotordynamics

Indexed keywords

FABRICATION; FOURIER TRANSFORMS; MICROELECTROMECHANICAL DEVICES; PLASMAS; REACTIVE ION ETCHING; SILICON WAFERS;

ETCH NON UNIFORMITY; HIGH SPEED MICROROTORS; PRECISION DEEP REACTIVE ION ETCHING; ROTORDYNAMICS;

ROTORS;

EID: 0038054499     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(03)00028-1     Document Type: Article

References (5)

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