-
1
-
-
0000070228
-
GaN on Si substrate with AlGaN/AlN intermediate layer
-
H. Ishikawa, G.-Y. Zhao, N. Nakada, T. Egawa, T. Jimbo, and M. Umeno, "GaN on Si substrate with AlGaN/AlN intermediate layer," Jpn. J. Appl. Phys., vol. 38, no. 5, pp. 492-494, May 1999. (Pubitemid 129572313)
-
(1999)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.38
, Issue.5 PART 2
, pp. 492-494
-
-
Ishikawa, H.1
Zhao, G.-Y.2
Nakada, N.3
Egawa, T.4
Jimbo, T.5
Umeno, M.6
-
2
-
-
67649965915
-
Recent advances in GaN transistors for future emerging applications
-
Jun
-
M. Yanagihara, Y. Uemoto, T. Ueda, T. Tanaka, and D. Ueda, "Recent advances in GaN transistors for future emerging applications," Phys. Stat. Solidi (A), vol. 206, no. 6, pp. 1221-1227, Jun. 2009.
-
(2009)
Phys. Stat. Solidi (A)
, vol.206
, Issue.6
, pp. 1221-1227
-
-
Yanagihara, M.1
Uemoto, Y.2
Ueda, T.3
Tanaka, T.4
Ueda, D.5
-
3
-
-
68349132086
-
GaN transistors for power switching and millimeter-wave applications
-
Mar.
-
T. Ueda, Y. Uemoto, T. Tanaka, and D. Ueda, "GaN transistors for power switching and millimeter-wave applications," Int. J. High Speed Electron. Syst., vol. 19, no. 1, pp. 145-152 Mar. 2009.
-
(2009)
Int. J. High Speed Electron. Syst.
, vol.19
, Issue.1
, pp. 145-152
-
-
Ueda, T.1
Uemoto, Y.2
Tanaka, T.3
Ueda, D.4
-
4
-
-
77953989281
-
High-brightness 350nm ultraviolet InAl- GaN light emitting diodes on Si(111) substrate with transparent AlN/AlGaN buffer structure
-
Mar.
-
Y. Fukushima and T. Ueda, "High-brightness 350nm ultraviolet InAl- GaN light emitting diodes on Si(111) substrate with transparent AlN/AlGaN buffer structure," Jpn. J. Appl. Phys., vol. 49, no. 3, pp. 032101-1-032101-5, Mar. 2010.
-
(2010)
Jpn. J. Appl. Phys.
, vol.49
, Issue.3
, pp. 0321011-0321015
-
-
Fukushima, Y.1
Ueda, T.2
-
5
-
-
0042378607
-
Atomic arrangement at the AlN/Si (111) interface
-
Aug
-
J. Wang, R. Liu, F. A. Ponce, A. Dadgar, and A. Krost, "Atomic arrangement at the AlN/Si (111) interface," Appl. Phys. Lett., vol. 83, no. 5, pp. 860-862, Aug. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.83
, Issue.5
, pp. 860-862
-
-
Wang, J.1
Liu, R.2
Ponce, F.A.3
Dadgar, A.4
Krost, A.5
-
6
-
-
0028404499
-
Effect of Si interlayers on stress and curvature radius of GaAs/Si and GaAs/Si/GaAs/Si heterostructures with interfacial misfit dislocations
-
Mar
-
K. Nakajima and K. Furuya, "Effect of Si interlayers on stress and curvature radius of GaAs/Si and GaAs/Si/GaAs/Si heterostructures with interfacial misfit dislocations," Jpn. J. Appl. Phys., vol. 33, no. 3, pp. 1420-1426, Mar. 1994.
-
(1994)
Jpn. J. Appl. Phys.
, vol.33
, Issue.3
, pp. 1420-1426
-
-
Nakajima, K.1
Furuya, K.2
-
7
-
-
0036724639
-
Reduction of cracks in GaN films grown on Si-on-insulator by lateral confined epitaxy
-
DOI 10.1016/S0022-0248(02)01578-6, PII S0022024802015786
-
S. Zamir, B. Meyler, and J. Salzman, "Reduction of cracks in GaN films grown on Si-on-insulator by lateral confined epitaxy," J. Cryst. Growth, vol. 243, nos. 3-4, pp. 375-380, Sep. 2002. (Pubitemid 34963468)
-
(2002)
Journal of Crystal Growth
, vol.243
, Issue.3-4
, pp. 375-380
-
-
Zamir, S.1
Meyler, B.2
Salzman, J.3
-
8
-
-
36749108587
-
Thermal expansion of AlN, sapphire, and silicon
-
Mar
-
W. M. Yim and R. J. Paff, "Thermal expansion of AlN, sapphire, and silicon," J. Appl. Phys., vol. 45, no. 3, pp. 1456-1457, Mar. 1974.
-
(1974)
J. Appl. Phys.
, vol.45
, Issue.3
, pp. 1456-1457
-
-
Yim, W.M.1
Paff, R.J.2
-
9
-
-
0027575890
-
Relaxation mechanism of thermal stresses in the heterostructure of GaN grown on sapphire by vapor phase epitaxy
-
Apr
-
K. Hiramatsu, T. Detchprohm, and I. Akasaki, "Relaxation mechanism of thermal stresses in the heterostructure of GaN grown on sapphire by vapor phase epitaxy," Jpn. J. Appl. Phys., vol. 32, no. 4, pp. 1528-1533, Apr. 1993.
-
(1993)
Jpn. J. Appl. Phys.
, vol.32
, Issue.4
, pp. 1528-1533
-
-
Hiramatsu, K.1
Detchprohm, T.2
Akasaki, I.3
-
10
-
-
0035839821
-
Thermal expansion and elastic properties of InN
-
DOI 10.1063/1.1400082
-
K. Wang and R. R. Reeber, "Thermal expansion and elastic properties of InN," Appl. Phys. Lett., vol. 79, no. 11, pp. 1602-1604, Sep. 2001. (Pubitemid 33598476)
-
(2001)
Applied Physics Letters
, vol.79
, Issue.11
, pp. 1602-1604
-
-
Wang, K.1
Reeber, R.R.2
-
11
-
-
0028442774
-
Scanning tunneling microscope observation of Si(111)-3×1-Ag structure
-
Jun.
-
H. Ohnishi, I. Katayama, Y. Ohba, and K. Oura, "Scanning tunneling microscope observation of Si(111)-3×1-Ag structure," Jpn. J. Appl. Phys., vol. 33, no. 6B, pp. 3683-3687, Jun. 1994.
-
(1994)
Jpn. J. Appl. Phys.
, vol.33
, Issue.6 B
, pp. 3683-3687
-
-
Ohnishi, H.1
Katayama, I.2
Ohba, Y.3
Oura, K.4
-
12
-
-
0022614786
-
Elastic properties of aluminum nitride
-
May
-
D. Gerlich, S. L. Dole, and G. A. Slack, "Elastic properties of aluminum nitride," J. Phys. Chem. Solids, vol. 47, no. 5, pp. 437-441, May 1986.
-
(1986)
J. Phys. Chem. Solids
, vol.47
, Issue.5
, pp. 437-441
-
-
Gerlich, D.1
Dole, S.L.2
Slack, G.A.3
-
13
-
-
0001495657
-
Elastic properties of zinc-blende and wurtzite AIN, GaN, and InN
-
A. F. Wright, "Elastic properties of zinc-blende and wurtzite AlN, GaN, and InN," J. Appl. Phys., vol. 82, no. 6, pp. 2833-2839, Sep. 1997. (Pubitemid 127657611)
-
(1997)
Journal of Applied Physics
, vol.82
, Issue.6
, pp. 2833-2839
-
-
Wright, A.F.1
-
14
-
-
0029390089
-
Calculated elastic constants of wide band gap semiconductor thin films with a hexagonal crystal structure for stress problems
-
Oct
-
R. Thokala and J. Chaudhuri, "Calculated elastic constants of wide band gap semiconductor thin films with a hexagonal crystal structure for stress problems," Thin Solid Films, vol. 266, no. 2, pp. 189-191, Oct. 1995.
-
(1995)
Thin Solid Films
, vol.266
, Issue.2
, pp. 189-191
-
-
Thokala, R.1
Chaudhuri, J.2
-
15
-
-
84897062779
-
Relaxation process of the thermal strain in the GaN/α-Al2O3 heterostructure and determination of the intrinsic lattice constants of gan free from the strain
-
Oct.
-
T. Detchprohm, K. Hiramatsu, K. Itoh, and I. Akasaki, "Relaxation process of the thermal strain in the GaN/α-Al2O3 heterostructure and determination of the intrinsic lattice constants of gan free from the strain," Jpn. J. Appl. Phys., vol. 31, no. 10B, pp. L1454-L1456, Oct. 1992.
-
(1992)
Jpn. J. Appl. Phys.
, vol.31
, Issue.10 B
-
-
Detchprohm, T.1
Hiramatsu, K.2
Itoh, K.3
Akasaki, I.4
-
16
-
-
13744263753
-
Role of AlN/GaN multilayer in crack-free GaN layer growth on 5″ φ Si (111) substrate
-
DOI 10.1143/JJAP.43.L1595
-
T. Sugahara, J.-S. Lee, and K. Ohtsuka, "Role of AlN/GaN multilayer in crack-free gan layer growth on 5' Si (111) substrate," Jpn. J. Appl. Phys., vol. 43, no. 12B, pp. L1595-L1597, Dec. 2004. (Pubitemid 40238502)
-
(2004)
Japanese Journal of Applied Physics, Part 2: Letters
, vol.43
, Issue.12 B
-
-
Sugahara, T.1
Lee, J.-S.2
Ohtsuka, K.3
-
17
-
-
0036139359
-
InGaN multiple-quantum-well green light-emitting diodes on Si grown by metalorganic chemical vapor deposition
-
Jan
-
T. Egawa, B. Zhang, N. Nishikawa, H. Ishikawa, T. Jimbo, and M. Umeno, "InGaN multiple-quantum-well green light-emitting diodes on Si grown by metalorganic chemical vapor deposition," J. Appl. Phys., vol. 91, no. 1, pp. 528-530, Jan. 2002.
-
(2002)
J. Appl. Phys.
, vol.91
, Issue.1
, pp. 528-530
-
-
Egawa, T.1
Zhang, B.2
Nishikawa, N.3
Ishikawa, H.4
Jimbo, T.5
Umeno, M.6
-
18
-
-
4143078533
-
Defects in epitaxial multilayers: III. Preparation of almost perfect multilayers
-
Feb
-
J. W. Matthews and A. E. Blakeslee, "Defects in epitaxial multilayers: III. Preparation of almost perfect multilayers," J. Cryst. Growth, vol. 32, no. 2, pp. 265-273, Feb. 1974.
-
(1974)
J. Cryst. Growth
, vol.32
, Issue.2
, pp. 265-273
-
-
Matthews, J.W.1
Blakeslee, A.E.2
-
19
-
-
0142038457
-
Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures
-
Jan
-
O. Ambacher, B. Foutz, J. Smart, J. R. Shealy, N. G. Weimann, K. Chu, M. Murphy, A. J. Sierakowski, W. J. Schaff, and L. F. Eastman, "Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures," J. Appl. Phys., vol. 87, no. 1, pp. 334-344, Jan. 2000.
-
(2000)
J. Appl. Phys.
, vol.87
, Issue.1
, pp. 334-344
-
-
Ambacher, O.1
Foutz, B.2
Smart, J.3
Shealy, J.R.4
Weimann, N.G.5
Chu, K.6
Murphy, M.7
Sierakowski, A.J.8
Schaff, W.J.9
Eastman, L.F.10
-
20
-
-
51349129590
-
Very high channel conductivity in lowdefect AlN/GaN high electron mobility transistor structures
-
Aug
-
A. M. Dabiran, A. M. Wowchak, A. Osinsky, J. Xie, B. Hertog, B. Cui, D. C. Look, and P. P. Chow, "Very high channel conductivity in lowdefect AlN/GaN high electron mobility transistor structures," Appl. Phys. Lett., vol. 93, no. 8, pp. 082111-1-082111-3, Aug. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.8
, pp. 0821111-0821113
-
-
Dabiran, A.M.1
Wowchak, A.M.2
Osinsky, A.3
Xie, J.4
Hertog, B.5
Cui, B.6
Look, D.C.7
Chow, P.P.8
-
21
-
-
41749121932
-
Effect of Al composition and gate recess on power performance of AlGaN/ GaN high-electron mobility transistors
-
DOI 10.1109/LED.2008.917936
-
Y. Pei, R. Chu, L. Shen, N. A. Fichtenbaum, Z. Chen, D. Brown, S. Keller, S. P. Denbaars, and U. K. Mishra, "Effect of Al composition and gate recess on power performance of AlGaN/GaN highelectron mobility transistors," IEEE Electron Device Lett., vol. 29, no. 4, pp. 300-302, Apr. 2008. (Pubitemid 351486764)
-
(2008)
IEEE Electron Device Letters
, vol.29
, Issue.4
, pp. 300-302
-
-
Pei, Y.1
Chu, R.2
Shen, L.3
Fichtenbaum, N.A.4
Chen, Z.5
Brown, D.6
Keller, S.7
Denbaars, S.P.8
Mishra, U.K.9
-
22
-
-
31744436913
-
Recessed-gate structure approach toward normally off high-voltage AlGaN/GaN HEMT for power electronics applications
-
DOI 10.1109/TED.2005.862708
-
W. Saito, Y. Takada, M. Kuraguchi, K. Tsuda, and I. Omura, "Recessed gate structure approach toward normally off high-voltage AlGaN/GaN HEMT for power electronics applications," IEEE Trans. Electron Devices, vol. 53, no. 2, pp. 356-362, Feb. 2006. (Pubitemid 43174052)
-
(2006)
IEEE Transactions on Electron Devices
, vol.53
, Issue.2
, pp. 356-362
-
-
Saito, W.1
Takada, Y.2
Kuraguchi, M.3
Tsuda, K.4
Omura, I.5
-
23
-
-
33947182926
-
Control of threshold voltage of AlGaN/GaN HEMTs by fluoride-based plasma treatment: From depletion mode to enhancement mode
-
Sep
-
Y. Cai, Y. Zhou, K. M. Lau, and K. J. Chen, "Control of threshold voltage of AlGaN/GaN HEMTs by fluoride-based plasma treatment: From depletion mode to enhancement mode," IEEE Trans. Electron Devices, vol. 53, no. 9, pp. 2207-2215, Sep. 2006.
-
(2006)
IEEE Trans. Electron Devices
, vol.53
, Issue.9
, pp. 2207-2215
-
-
Cai, Y.1
Zhou, Y.2
Lau, K.M.3
Chen, K.J.4
-
24
-
-
47249146111
-
AlGaN/GaN recessed MIS-gate HFET with high-threshold-voltage normally-off operation for power electronics applications
-
Jul
-
T. Oka and T. Nozawa, "AlGaN/GaN recessed MIS-gate HFET with high-threshold-voltage normally-off operation for power electronics applications," IEEE Electron Device Lett., vol. 29, no. 7, pp. 668-670, Jul. 2008.
-
(2008)
IEEE Electron Device Lett.
, vol.29
, Issue.7
, pp. 668-670
-
-
Oka, T.1
Nozawa, T.2
-
25
-
-
77649179512
-
Enhancement-mode GaN MIS-HEMTs with n-GaN/i- AlN/n-GaN triple cap layer and High-κ gate dielectrics
-
Mar
-
M. Kanamura, T. Ohki, T. Kikkawa, K. Imanishi, T. Imada, A. Yamada, and N. Hara, "Enhancement-mode GaN MIS-HEMTs with n-GaN/i- AlN/n-GaN triple cap layer and High-κ gate dielectrics," IEEE Electron Device Lett., vol. 31, no. 3, pp. 189-191, Mar. 2010.
-
(2010)
IEEE Electron Device Lett.
, vol.31
, Issue.3
, pp. 189-191
-
-
Kanamura, M.1
Ohki, T.2
Kikkawa, T.3
Imanishi, K.4
Imada, T.5
Yamada, A.6
Hara, N.7
-
26
-
-
38149014747
-
Gate injection transistor(GIT) - A Normally-Off AlGaN/GaN power transistor using conductivity modulation
-
Dec
-
Y. Uemoto, M. Hikita, H. Ueno, H. Matsuo, H. Ishida, M. Yanagihara, T. Ueda, T. Tanaka, and D. Ueda, "Gate injection transistor(GIT) - A Normally-Off AlGaN/GaN power transistor using conductivity modulation," IEEE Trans. Electron Device, vol. 54, no. 12, pp. 3393-3399, Dec. 2007.
-
(2007)
IEEE Trans. Electron Device
, vol.54
, Issue.12
, pp. 3393-3399
-
-
Uemoto, Y.1
Hikita, M.2
Ueno, H.3
Matsuo, H.4
Ishida, H.5
Yanagihara, M.6
Ueda, T.7
Tanaka, T.8
Ueda, D.9
-
27
-
-
33947235698
-
The effect of an Fe-doped GaN buffer on OFF-state breakdown characteristics in AlGaN/GaN HEMTs on Si substrate
-
DOI 10.1109/TED.2006.885679
-
Y. C. Choi, M. Pophristic, H.-Y. Cha, B. Peres, M. G. Spencer, and L. F. Eastman, " The effect of an fe-doped GaN buffer on off-state breakdown characteristics in AlGaN/GaN HEMTs on Si substrate," IEEE Trans. Electron Devices, vol. 53, no. 12, pp. 2926-2931, Dec. 2006. (Pubitemid 46417103)
-
(2006)
IEEE Transactions on Electron Devices
, vol.53
, Issue.12
, pp. 2926-2931
-
-
Choi, Y.C.1
Pophristic, M.2
Cha, H.-Y.3
Peres, B.4
Spencer, M.G.5
Eastman, L.F.6
-
28
-
-
34547880100
-
High critical electric field exceeding 8 MV/cm measured using an AlGaN p-i-n vertical conducting diode on n-SiC substrate
-
DOI 10.1143/JJAP.46.2316, Solid State Devices and Materials
-
A. Nishikawa, K. Kumakura, and T. Makimoto, "High critical electric field exceeding 8 MV/cm measured using an AlGaN p-i-n vertical conducting diode on n-SiC substrate," Jpn. J. Appl. Phys., vol. 46, no. 4B, pp. 2316-2319, Apr. 2007. (Pubitemid 47256771)
-
(2007)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.46
, Issue.4 B
, pp. 2316-2319
-
-
Nishikawa, A.1
Kumakura, K.2
Makimoto, T.3
-
29
-
-
79251618532
-
High power AlGaN/GaN HFETs on 4 inch Si substrates
-
Jun
-
N. Ikeda, S. Kaya, J. Li, Y. Sato, T. Kokawa, and S. Kato, "High power AlGaN/GaN HFETs on 4 inch Si substrates," Phys. Stat. Solidi, vol. 6, no. S2, pp. S933-S936, Jun. 2009.
-
(2009)
Phys. Stat. Solidi
, vol.6
, Issue.S2
-
-
Ikeda, N.1
Kaya, S.2
Li, J.3
Sato, Y.4
Kokawa, T.5
Kato, S.6
-
30
-
-
67649342389
-
Breakdown enhancement of AlGaN/GaN HEMTs on 4-in silicon by improving the GaN quality on thick buffer layers
-
Jun
-
S. L. Selvaraj, T. Suzue, and T. Egawa, "Breakdown enhancement of AlGaN/GaN HEMTs on 4-in silicon by improving the GaN quality on thick buffer layers," IEEE Electron Device Lett., vol. 30, no. 6, pp. 587-589, Jun. 2009.
-
(2009)
IEEE Electron Device Lett.
, vol.30
, Issue.6
, pp. 587-589
-
-
Selvaraj, S.L.1
Suzue, T.2
Egawa, T.3
-
31
-
-
77955175521
-
Silicon substrate removal of GaN DHFETs for enhanced (<1100 V) breakdown voltage
-
Aug
-
P. Srivastava, J. Das, D. Visalli, J. Derluyn, M. Van Hove, P. E. Malinowski, D. Marcon, K. Geens, K. Cheng, S. Degroote, M. Leys, M. Germain, S. Decoutere, R. P. Mertens, and G. Borghs, "Silicon substrate removal of GaN DHFETs for enhanced (<1100 V) breakdown voltage," IEEE Electron Device Lett., vol. 31, no. 8, pp. 851-853, Aug. 2010.
-
(2010)
IEEE Electron Device Lett.
, vol.31
, Issue.8
, pp. 851-853
-
-
Srivastava, P.1
Das, J.2
Visalli, D.3
Derluyn, J.4
Van Hove, M.5
Malinowski, P.E.6
Marcon, D.7
Geens, K.8
Cheng, K.9
Degroote, S.10
Leys, M.11
Germain, M.12
Decoutere, S.13
Mertens, R.P.14
Borghs, G.15
-
32
-
-
77956105850
-
High breakdown (1500V) AlGaN/GaN HEMTs by substrate-transfer technology
-
Sep
-
B. Lu and T. Palacious, "High breakdown (1500V) AlGaN/GaN HEMTs by substrate-transfer technology," IEEE Electron Device Lett., vol. 31, no. 9, pp. 951-953, Sep. 2010.
-
(2010)
IEEE Electron Device Lett.
, vol.31
, Issue.9
, pp. 951-953
-
-
Lu, B.1
Palacious, T.2
-
33
-
-
80051581814
-
Improved power device figure-of-merit (4.0 × 108 V2 - "1 cm"2) in AlGaN/GaN high-electron-mobility transistors on high-resistivity 4-in. Si
-
Aug.
-
S. Arulkumaran, S. Vicknesh, N. G. Ing, S. L. Selvaraj, and T. Egawa, "Improved power device figure-of-merit (4.0 × 108 V2 - "1 cm"2) in AlGaN/GaN high-electron-mobility transistors on high-resistivity 4-in. Si," Appl. Phys. Exp., vol. 4, no. 8, pp. 084101-1-084101-3, Aug. 2011.
-
(2011)
Appl. Phys. Exp.
, vol.4
, Issue.8
, pp. 0841011-0841013
-
-
Arulkumaran, S.1
Vicknesh, S.2
Ing, N.G.3
Selvaraj, S.L.4
Egawa, T.5
-
34
-
-
79955749498
-
99.3% efficiency of three-phase inverter for motor drive using GaN-based gate injection transistors
-
Mar.
-
T. Morita, S. Tamura, Y. Anda, M. Ishida, Y. Uemoto, T. Ueda, T. Tanaka, and D. Ueda, "99.3% efficiency of three-phase inverter for motor drive using GaN-based gate injection transistors," in Proc. IEEE Appl. Power Electron. Conf., Mar. 2011, pp. 481-484.
-
Proc. IEEE Appl. Power Electron. Conf.
, vol.2011
, pp. 481-484
-
-
Morita, T.1
Tamura, S.2
Anda, Y.3
Ishida, M.4
Uemoto, Y.5
Ueda, T.6
Tanaka, T.7
Ueda, D.8
|