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Volumn 19, Issue 1, 2009, Pages 145-152

GaN transistors for power switching and millimeter-wave applications

Author keywords

AlGaN GaN; Breakdown voltage; Gate Injection Transistor; Heterojunction FET; Microstrip line; MIS HFET; On state resistance

Indexed keywords

ALGAN/GAN; BREAKDOWN VOLTAGE; GATE INJECTION TRANSISTOR; HETEROJUNCTION FET; MIS-HFET; ON-STATE RESISTANCE;

EID: 68349132086     PISSN: 01291564     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0129156409006199     Document Type: Conference Paper
Times cited : (30)

References (10)
  • 4
    • 65249171964 scopus 로고    scopus 로고
    • Silicon Dioxide-Encapsulated High-Voltage AlGaN/GaN HFETs for Power-Switching Applications
    • N.Tipimeni, V.Adivarahan, G.Simin, and A.Khan, "Silicon Dioxide-Encapsulated High-Voltage AlGaN/GaN HFETs for Power-Switching Applications", IEEE Electron Device Letters, vol.28, no.9, pp784-786, 2007.
    • (2007) IEEE Electron Device Letters , vol.28 , Issue.9 , pp. 784-786
    • Tipimeni, N.1    Adivarahan, V.2    Simin, G.3    Khan, A.4
  • 9
    • 42249108853 scopus 로고    scopus 로고
    • Crystalline SiNx Ultrathin Films Grown on AlGaN/GaN Using In-Situ Metalorganic Chemical Vapor Deposition
    • T. Takizawa, S. Nakazawa, and T Ueda, "Crystalline SiNx Ultrathin Films Grown on AlGaN/GaN Using In-Situ Metalorganic Chemical Vapor Deposition," J. Electron. Mater., vol. 37, pp.628-634, 2008.
    • (2008) J. Electron. Mater , vol.37 , pp. 628-634
    • Takizawa, T.1    Nakazawa, S.2    Ueda, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.