Influence of oxygen on some oxide films prepared by ion beam sputter deposition

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 88-93

  Lee, Cheng Chung ^a   Wei, David T ^a,b   Hsu, Jin Cherng ^a   Shen, Chan Han ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b Wei and Associates   (United States)

Author keywords

Deposition rate; Ion beam sputter deposition; Oxygen pressure; Surface roughness

Indexed keywords

COMPOSITION EFFECTS; ION BEAMS; MORPHOLOGY; OXYGEN; PRESSURE EFFECTS; REFRACTIVE INDEX; SILICA; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; TITANIUM OXIDES; ZIRCONIA;

BAKING EFFECTS;

OPTICAL FILMS;

EID: 0030386763     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09096-7     Document Type: Article

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