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Volumn 398, Issue 399, 2001, Pages 35-40

Growth and properties of alumina films obtained by low-pressure metal-organic chemical vapor deposition

Author keywords

Metal organic chemical vapor deposition; Oxide; Thin film

Indexed keywords

ACTIVATION ENERGY; ADHESION; ALUMINA; ARGON; ATOMIC FORCE MICROSCOPY; FILM GROWTH; FILM PREPARATION; GLASS; HARDNESS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; STRESS ANALYSIS; SUBSTRATES; VAPORIZATION;

EID: 0035506997     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01300-1     Document Type: Article
Times cited : (48)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.