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Volumn 398, Issue 399, 2001, Pages 35-40
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Growth and properties of alumina films obtained by low-pressure metal-organic chemical vapor deposition
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Author keywords
Metal organic chemical vapor deposition; Oxide; Thin film
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Indexed keywords
ACTIVATION ENERGY;
ADHESION;
ALUMINA;
ARGON;
ATOMIC FORCE MICROSCOPY;
FILM GROWTH;
FILM PREPARATION;
GLASS;
HARDNESS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON;
STRESS ANALYSIS;
SUBSTRATES;
VAPORIZATION;
CRACKED SURFACES;
AMORPHOUS FILMS;
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EID: 0035506997
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(01)01300-1 Document Type: Article |
Times cited : (48)
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References (30)
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