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Volumn 519, Issue 8, 2011, Pages 2520-2526

A study of microstructural and optical properties of nanocrystalline ceria thin films prepared by pulsed laser deposition

(8) Balakrishnan, G b,c Sundari, S Tripura a Kuppusami, P a Mohan, P Chandra d Srinivasan, M P d Mohandas, E a Ganesan, V e Sastikumar, D b

a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH (India)

b NATIONAL INSTITUTE OF TECHNOLOGY (India)

c Peri Institute of Technology (India)

d BHABHA ATOMIC RESEARCH CENTRE (India)

e UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH (India)

Author keywords

Cerium oxide; Ellipsometry; Pulsed laser deposition; Thin films; X ray diffraction

Indexed keywords

ACTIVE MODE; ATOMIC FORCE; CERIA THIN FILMS; CERIUM OXIDES; CUBIC STRUCTURE; DEPOSITED FILMS; FREQUENCY SHIFT; HIGHER TEMPERATURES; LINE BROADENING; MICRO-STRUCTURAL; NANOCRYSTALLINES; OXYGEN PARTIAL PRESSURE; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; PULSED-LASER DEPOSITION TECHNIQUE; RAMAN PEAK; REFRACTIVE INDEX AND BAND GAP; ROOM TEMPERATURE; SI SUBSTRATES; SUBSTRATE TEMPERATURE; SYSTEMATIC VARIATION; TEMPERATURE RANGE; TEXTURE COEFFICIENT; VARIOUS SUBSTRATES; XRD;

ATOMIC FORCE MICROSCOPY; CERIUM; CERIUM COMPOUNDS; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; DIFFRACTION; ELLIPSOMETRY; ORGANIC POLYMERS; OXIDE FILMS; OXIDES; OXYGEN; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAYS;

PULSED LASERS;

EID: 79551495759 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.013 Document Type: Article

Times cited : (69)

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