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Applied Surface Science

Volumn 257, Issue 20, 2011, Pages 8506-8510

Influence of oxygen partial pressure on the properties of pulsed laser deposited nanocrystalline zirconia thin films

(7) Balakrishnan, G b Sairam, T N a Kuppusami, P a Thiumurugesan, R a Mohandas, E a Ganesan, V c Sastikumar, D d

a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH (India)

b Peri Institute of Technology (India)

c UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH (India)

d NATIONAL INSTITUTE OF TECHNOLOGY (India)

Author keywords

Pulsed laser deposition; Thin films; UV visible spectroscopy; X ray diffraction; Zirconia

Indexed keywords

FILM PREPARATION; INFRARED SPECTROPHOTOMETERS; NANOCRYSTALLINE POWDERS; NANOCRYSTALS; OXYGEN; PARTIAL PRESSURE; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; ZIRCONIA;

ABSORPTION EDGES; INFLUENCE OF OXYGEN; NANOCRYSTALLINE ZIRCONIA; OXYGEN PARTIAL PRESSURE; QUARTZ SUBSTRATE; TETRAGONAL PHASIS; UV VISIBLE SPECTROSCOPY; WAVELENGTH RANGES;

OPTICAL FILMS;

EID: 79959371099 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.05.003 Document Type: Article

Times cited : (29)

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