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Surface and Coatings Technology

Volumn 176, Issue 3, 2004, Pages 382-384

Crystallinity of Al2O3 films deposited by metalorganic chemical vapor deposition

(3) Pradhan, Siddhartha K a Reucroft, Philip J a Ko, Yeonkyu b

a UNIVERSITY OF KENTUCKY (United States)

b Kookmin University (South Korea)

Author keywords

Alumina thin films; MOCVD; Al2O3

Indexed keywords

ALUMINA; AMORPHOUS FILMS; CRYSTALLIZATION; FILM GROWTH; HIGH TEMPERATURE APPLICATIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION;

FILM DEPOSITION;

COATINGS;

CRYSTALLIZATION;

EID: 0242709021 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00750-3 Document Type: Article

Times cited : (40)

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