XPS studies on the interaction of CeO 2 with silicon in magnetron sputtered CeO 2 thin films on Si and Si 3 N 4 substrates

Applied Surface Science

Volumn 283, Issue , 2013, Pages 297-303

  Anandan, C ^a   Bera, Parthasarathi ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Interfacial reaction; Silicon; Silicon nitride; Thin film; XPS

Indexed keywords

CERIUM OXIDE; MAGNETRON SPUTTERING; NITRIDES; SILICATES; SILICON; SILICON NITRIDE; SUBSTRATES; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CEO2 FILM; CORE-LEVEL SPECTRA; IN-VACUUM; OXIDATION STATE; SI SUBSTRATES;

THIN FILMS;

EID: 84883188017     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.06.104     Document Type: Article

References (55)

1. A. Trovarelli Catalysis by Ceria and Related Materials 2002 Imperial College Press London
2. P. Bera, and M.S. Hegde Catalysis Surveys from Asia 15 2011 181
3. M. Mogensen, N.M. Sammes, and G.A. Tompsett Solid State Ionics 129 2000 63
4. H. Inaba, and H. Tagawa Solid State Ionics 83 1996 1
5. R.M. Bueno, J.M. Martinez-Duart, M. Hernández-Vélez, and L. Vázquez Journal of Materials Science 32 1997 1861
6. M.R. Mohammadi, and D.J. Fray Sensors and Actuators B 150 2010 631
7. X. Zhong, Q. Li, J. Hu, and Y. Lu Corrosion Science 50 2008 2304
8. A. Samide, and B. Tutunaru Chemical & Biochemical Engineering Quarterly 25 2011 203
9. P.Y. Sheng, W.W. Chiu, A. Yee, S.J. Morrison, and H. Idriss Catalysis Today 129 2007 313
10. M. Václavů, I. Matolínová, J. Mysliveček, R. Fiala, and V. Matolín Journal of the Electrochemical Society 156 2009 B938
11. W.-H. Kim, W.J. Maeng, M.-K. Kim, J. Gatineau, and H. Kim Journal of the Electrochemical Society 158 2011 G217
12. J.C. Wang, K.C. Chiang, T.F. Lei, and C.L. Lee Electrochemical and Solid-State Letters 7 2004 E55
13. F. Pagliuca, P. Luches, and S. Valeri Surface Science 607 2013 164
14. T. Chikyow, S.M. Bedair, L. Tye, and N.A. El-Masry Applied Physics Letters 65 1994 1030
15. I. Porqueras, C. Person, C. Corbella, M. Vives, A. Pinyol, and E. Bertran Solid State Ionics 165 2003 131
16. L. Kim, J. Kim, D. Jung, C.-Y. Park, C.-W. Yang, and Y. Roh Thin Solid Films 360 2000 154
17. M.-T. Ta, D. Briand, Y. Guhel, J. Bernard, J.C. Pesant, and B. Boudart Thin Solid Films 517 2008 450
18. A. Ramírez-Duverger, A.R. Ruiz-Salvador, M.P. Hernández- Sánchez, M.F. García-Sánchez, and G. Rodríguez- Gattorno Solid State Ionics 96 1997 89
19. B. Hirschauer, G. Chiaia, M. Göthelid, and U.O. Karlsson Thin Solid Films 348 1999 3
20. D. Huang, F. Qin, Z. Yao, Z. Ren, L. Lin, W. Gao, and Q. Ren Applied Physics Letters 67 1995 3724
21. J.T. Jones, E.T. Croke, C.M. Garland, O.J. Marsh, and T.C. McGill Journal of Vacuum Science & Technology B 16 1998 2686
22. D. Barreca, G. Bruno, A. Gasparotto, M. Losurdo, and E. Tondello Materials Science and Engineering: C 23 2003 1013
23. N. Özer Solar Energy Materials & Solar Cells 68 2001 391
24. S. Wang, W. Wang, Q. Liu, M. Zhang, and Y. Qian Solid State Ionics 133 2000 211
25. C.E. Guillaume, M. Vermeersch, J.J. Verbist, S. Mathot, and G. Demortier Surface and Interface Analysis 22 1994 186
26. E.J. Preisler, O.J. Marsh, R.A. Beach, and T.C. McGill Journal of Vacuum Science & Technology B 19 2001 1611
27. R. Barnes, D. Starodub, T. Gustafsson, and E. Garfunkel Journal of Applied Physics 100 2006 044103
28. T. Skála, and V. Matolín Applied Surface Science 265 2013 817
29. H. Wong, N. Zhan, K.L. Ng, M.C. Poon, and C.W. Kok Thin Solid Films 462-463 2004 96
30. R. Katamreddy, R. Inman, G. Jursich, A. Soulet, and C. Takoudis Thin Solid Films 516 2008 8498
31. H. Wang, P. Wu, X.F. Li, S. Chen, S.P. Zhang, and B.B. Song Applied Surface Science 257 2011 3440
32. H. Kobayashi, K. Imamura, K. Fukayama, S.-S. Im, O. Maida, Y.-B. Kim, H.-C. Kim, and D.-K. Choi Surface Science 602 2008 1948
33. P.D. Kirsch, C.S. Kang, J. Lozano, J.C. Lee, and J.G. Ekerdt Journal of Applied Physics 91 2002 4353
34. J. de Souza, A.G.P. da Silva, and H.R. Paes Jr. Journal of Materials Science: Materials in Electronics 18 2007 951
35. H.-Y. Lee, S.-I. Kim, Y.-P. Hong, Y.-C. Lee, Y.-H. Park, and K.-H. Ko Surface and Coatings Technology 173 2003 224
36. C. Hardacre, G.M. Roe, and R.M. Lambert Surface Science 326 1995 1
37. T. Inoue, Y. Yamamoto, S. Koyama, S. Suzuki, and Y. Ueda Applied Physics Letters 56 1990 1332
38. V. Fernandes, I.L. Graff, J. Varald, L. Amaral, P. Fichtner, D. Demaille, Y. Zheng, W.H. Schreiner, and D.H. Mosca Journal of the Electrochemical Society 159 2012 K27
39. Z. Wu, D. Huang, J. Wang, F. Qin, J. Zhang, and Z. Yang Vacuum 49 1998 133
40. B. Hirschauer, M. Göthelid, E. Janin, H. Lu, and U.O. Karlsson Applied Surface Science 148 1999 164
41. C.G. Kim Journal of Vacuum Science & Technology B 18 2000 2650
42. W.-H. Kim, M.-K. Kim, W.J. Maeng, J. Gatineau, V. Pallem, C. Dussarrat, A. Noori, D. Thompson, S. Chu, and H. Kim Journal of the Electrochemical Society 158 2011 G169
43. D. Briggs, and M.P. Seah Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy 1984 Wiley New York
44. A. Pfau, and K.D. Schierbaum Surface Science 321 1994 71
45. D.R. Mullins, S.H. Overbury, and D.R. Huntley Surface Science 409 1998 307
46. V. Chauvaut, V. Albin, H. Schneider, M. Cassir, H. Ardélé an, and A. Galtayries Journal of Applied Electrochemistry 30 2000 1405
47. E. Bêche, P. Charvin, D. Perarnau, S. Abanades, and G. Flamant Surface and Interface Analysis 40 2008 264
48. Y. Zhou, J.M. Perket, and J. Zhou The Journal of Physical Chemistry C 114 2010 11853
49. G. Hollinger, and F.J. Himpsel Applied Physics Letters 44 1984 93
50. J.R. Shallenberger Journal of Vacuum Science & Technology A 14 1996 693
51. S.I. Raider, R. Flitsch, J.A. Aboaf, and W.A. Pliskin Journal of the Electrochemical Society 123 1976 560
52. E. Paparazzo, G.M. Ingo, and Z. Zachhetti Journal of Vacuum Science & Technology A 9 1991 1416
53. W. Xiao, Q. Guo, and E.G. Wang Chemical Physics Letters 368 2003 527
54. A. Bahari, P. Morgen, and Z.S. Li Surface Science 600 2006 2966
55. C. Sénémaud, M. Driss-Khodja, A. Gheorghiu, S. Harel, G. Dufour, and H. Roulet Journal of Applied Physics 74 1993 5042