In situ synthesis of high density sub-50 nm zno nanopatterned arrays using diblock copolymer templates

ACS Applied Materials and Interfaces

Volumn 5, Issue 12, 2013, Pages 5727-5732

  Suresh, Vignesh ^a   Huang, Meiyu Stella ^a   Srinivasan, M P ^a   Krishnamoorthy, Sivashankar ^b,c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

Author keywords

atomic layer deposition; block copolymer; flash memory device; nanoarrays; nanolithography; nanoparticle; nanopattern; self assembly; sub 50 nm patterning; ZnO

Indexed keywords

CAPACITANCE VOLTAGE MEASUREMENTS; CHARGE TRAPPING CHARACTERISTICS; DIBLOCK COPOLYMER TEMPLATES; NANO PATTERN; NANOARRAYS; NONVOLATILE MEMORY DEVICES; SUB-50 NM; ZNO;

ATOMIC LAYER DEPOSITION; BLOCK COPOLYMERS; CHARGE TRAPPING; COPOLYMERS; FLASH MEMORY; MOS CAPACITORS; NANOLITHOGRAPHY; NANOPARTICLES; NONVOLATILE STORAGE; SELF ASSEMBLY; SEMICONDUCTING SILICON; ZINC;

ZINC OXIDE;

NANOMATERIAL; POLYSTYRENE BLOCK POLY(4 VINYLPYRIDINE); POLYSTYRENE DERIVATIVE; POLYSTYRENE-BLOCK-POLY(4-VINYLPYRIDINE); POLYVINYL DERIVATIVE; PYRIDINE DERIVATIVE; ZINC OXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRIC CAPACITANCE; METHODOLOGY; NANOTECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY; ULTRASTRUCTURE;

ELECTRIC CAPACITANCE; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, TRANSMISSION; NANOSTRUCTURES; NANOTECHNOLOGY; POLYSTYRENES; POLYVINYLS; PYRIDINES; ZINC OXIDE;

EID: 84879518072     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am401189p     Document Type: Article

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