Electrical properties of deposited ZrO2 films on ZnO/n-Si substrates

Semiconductor Science and Technology

Volumn 18, Issue 2, 2003, Pages 92-96

  Chatterjee, S ^a   Nandi, S K ^a   Maikap, S ^b   Samanta, S K ^a   Maiti, C K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DEPOSITION; ELECTRIC CHARGE; ELECTRIC CONDUCTANCE; ELECTRIC CURRENTS; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; STRESSES; SUBSTRATES; ZIRCONIA;

INTERFACE STATE DENSITY;

DIELECTRIC FILMS;

EID: 0037320398     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/18/2/305     Document Type: Article

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