Atomic layer deposition of Ru thin films using a Ru(0) metallorganic precursor and O2

ECS Journal of Solid State Science and Technology

Volumn 2, Issue 3, 2013, Pages

  Hong, Tae Eun ^a   Choi, Sang Hyeok ^b   Yeo, Seungmin ^b   Park, Ji Yoon ^b   Kim, Soo Hyun ^b   Cheon, Taehoon ^c   Kim, Hoon ^d   Kim, Min Kyu ^e   Kim, Hyungjun ^e  

^a Korea Basic Science Institute (KBSI)   (South Korea)

^b Yeungnam University   (South Korea)

^c Daegu Gyeongbuk Institute of Science and Technology   (South Korea)

^d IBM MICROELECTRONICS   (United States)

^e Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84879242440     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.001303jss     Document Type: Article

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