SCOPUS 정보 검색 플랫폼

Journal of Non-Crystalline Solids

Volumn 368, Issue 1, 2013, Pages 86-92

The effect of TEOS plasma parameters on the silicon dioxide deposition mechanisms

(4) Abbasi Firouzjah, Marzieh a Hosseini, Seyed Iman b Shariat, Mahdi a Shokri, Babak a

a SHAHID BEHESHTI UNIVERSITY (Iran)

b SHAHROOD UNIVERSITY OF TECHNOLOGY (Iran)

Author keywords

Electron impact; Oxidation; PECVD; Plasma; Silicon dioxide film

Indexed keywords

CHEMICAL COMPOSITIONS; ELECTRON IMPACT; FILM CHARACTERISTICS; MECHANISM OF DEPOSITIONS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; RADIO FREQUENCY POWER; SILICON DIOXIDE FILM; TETRAETHYL ORTHOSILICATES;

ARGON; ATOMIC FORCE MICROSCOPY; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ORGANOMETALLICS; OXIDATION; PLASMA DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; VAPORS;

PLASMAS;

EID: 84876098728 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2013.03.008 Document Type: Article

Times cited : (51)

References (28)

1
- 71749092329
- P. Panek, K. Drabczyk, A. Focsa, and A. Slaoui Mater. Sci. Eng. B 165 2009 64
- (2009) Mater. Sci. Eng. B , vol.165 , pp. 64
- Panek, P.¹ Drabczyk, K.² Focsa, A.³ Slaoui, A.⁴

2
- 80053249354
- M.R. Holmes, L. Shuo, J. Keeley, M. Jenkins, K. Leake, H. Schmidt, and A.R. Hawkins IEEE Photon. Technol. Lett. 23 2011 1466 1468
- (2011) IEEE Photon. Technol. Lett. , vol.23 , pp. 1466-1468
- Holmes, M.R.¹ Shuo, L.² Keeley, J.³ Jenkins, M.⁴ Leake, K.⁵ Schmidt, H.⁶ Hawkins, A.R.⁷

3
- 19944394895
- R.A.M. Carvalho, R.R. Lima, A.P. Nascimento Filho, M.L.P. Silva, and N.R. Demarquette Sens. Actuators B 108 2005 955 963
- (2005) Sens. Actuators B , vol.108 , pp. 955-963
- Carvalho, R.A.M.¹ Lima, R.R.² Nascimento Filho, A.P.³ Silva, M.L.P.⁴ Demarquette, N.R.⁵

4
- 84865209902
- A. Mahdjoub Semicond. Phys. Quant. Electron. Optoelectron. 10 2007 60 66
- (2007) Semicond. Phys. Quant. Electron. Optoelectron. , vol.10 , pp. 60-66
- Mahdjoub, A.¹

5
- 33646134611
- Ch. Voulgaris, E. Amanatides, D. Mataras, S. Grassini, E. Angelini, and F. Rosalbino Surf. Coat. Technol. 200 2006 6618 6622
- (2006) Surf. Coat. Technol. , vol.200 , pp. 6618-6622
- Voulgaris, Ch.¹ Amanatides, E.² Mataras, D.³ Grassini, S.⁴ Angelini, E.⁵ Rosalbino, F.⁶

6
- 77956257632
- P.A. Premkumar, S.A. Starostin, M. Creatore, H. de Vries, R.M.J. Paffen, P.M. Koenraad, and M.C.M. van de Sanden Plasma Process. Polym. 7 2010 635 639
- (2010) Plasma Process. Polym. , vol.7 , pp. 635-639
- Premkumar, P.A.¹ Starostin, S.A.² Creatore, M.³ De Vries, H.⁴ Paffen, R.M.J.⁵ Koenraad, P.M.⁶ Van De Sanden, M.C.M.⁷

7
- 58149216484
- T.H. Chung, M.S. Kang, C.J. Chung, and Y. Kim Curr. Appl. Phys. 9 2009 598 604
- (2009) Curr. Appl. Phys. , vol.9 , pp. 598-604
- Chung, T.H.¹ Kang, M.S.² Chung, C.J.³ Kim, Y.⁴

8
- 73849118637
- J. Kim, S. Jung, K. Jang, H. Park, J. Cho, W. Lee, D. Gong, B. Choi, Y. Kim, J. Park, K. Kim, and J. Yi Electrochem. Soc. 157 2010 182 185
- (2010) Electrochem. Soc. , vol.157 , pp. 182-185
- Kim, J.¹ Jung, S.² Jang, K.³ Park, H.⁴ Cho, J.⁵ Lee, W.⁶ Gong, D.⁷ Choi, B.⁸ Kim, Y.⁹ Park, J.¹⁰ Kim, K.¹¹ Yi, J.¹²

9
- 33744517744
- A. Pecora, L. Maiolo, G. Fortunato, and C. Caligiore J. Non-Cryst. Solids 352 2006 1430 1433
- (2006) J. Non-Cryst. Solids , vol.352 , pp. 1430-1433
- Pecora, A.¹ Maiolo, L.² Fortunato, G.³ Caligiore, C.⁴

10
- 0026912334
- F. Fracassi, R. d'Agostino, and P. Favia J. Electrochem. Soc. 139 1992 2636 2642
- (1992) J. Electrochem. Soc. , vol.139 , pp. 2636-2642
- Fracassi, F.¹ D'Agostino, R.² Favia, P.³

11
- 78649425346
- E.B. Saloman J. Phys. Chem. Ref. Data 39 2010 033101
- (2010) J. Phys. Chem. Ref. Data , vol.39 , pp. 033101
- Saloman, E.B.¹

12
- 14644433805
- M. Goujon, T. Belmonte, and G. Henrion Surf. Coat. Technol. 188 189 2004 756 761
- (2004) Surf. Coat. Technol. , vol.188 , Issue.189 , pp. 756-761
- Goujon, M.¹ Belmonte, T.² Henrion, G.³

13
- 84956039541
- P.J. Stout, and M.J. Kushner J. Vac. Sci. Technol. A 11 1993 2562
- (1993) J. Vac. Sci. Technol. A , vol.11 , pp. 2562
- Stout, P.J.¹ Kushner, M.J.²

14
- 14644404978
- A.M. Mahajan, L.S. Patil, and D.K. Gautam Surf. Coat. Technol. 188 189 2004 314 318
- (2004) Surf. Coat. Technol. , vol.188 , Issue.189 , pp. 314-318
- Mahajan, A.M.¹ Patil, L.S.² Gautam, D.K.³

15
- 0031207156
- C. Martinet, V. Paillard, A. Gagnaire, and J. Joseph J. Non-Cryst. Solids 216 1997 77 82
- (1997) J. Non-Cryst. Solids , vol.216 , pp. 77-82
- Martinet, C.¹ Paillard, V.² Gagnaire, A.³ Joseph, J.⁴

16
- 0034140455
- M.T. Kim Thin Solid Films 360 2000 60 68
- (2000) Thin Solid Films , vol.360 , pp. 60-68
- Kim, M.T.¹

17
- 40649089414
- K. Takizawa, Y. Mori, N. Miyatake, and K. Murata Thin Solid Films 516 2008 3605 3609
- (2008) Thin Solid Films , vol.516 , pp. 3605-3609
- Takizawa, K.¹ Mori, Y.² Miyatake, N.³ Murata, K.⁴

18
- 78751562556
- Y.K. Lee, and C.W. Chung J. Appl. Phys. 109 2011 013306
- (2011) J. Appl. Phys. , vol.109 , pp. 013306
- Lee, Y.K.¹ Chung, C.W.²

19
- 0038685816
- K. Teshima, Y. Inoue, H. Sugimura, and O. Takai Surf. Coat. Technol. 169 2003 583 586
- (2003) Surf. Coat. Technol. , vol.169 , pp. 583-586
- Teshima, K.¹ Inoue, Y.² Sugimura, H.³ Takai, O.⁴

20
- 66049104797
- Y. Yin, D. Liu, D. Li, J. Gu, Z. Feng, J. Niu, G. Benstetter, and S. Zhang Appl. Surf. Sci. 255 2009 7708 7712
- (2009) Appl. Surf. Sci. , vol.255 , pp. 7708-7712
- Yin, Y.¹ Liu, D.² Li, D.³ Gu, J.⁴ Feng, Z.⁵ Niu, J.⁶ Benstetter, G.⁷ Zhang, S.⁸

21
- 0035505462
- S.E. Babayan, J.Y. Jeong, A. Schütze, V.J. Tu, M. Moravej, G.S. Selwyn, and R.F. Hicks Plasma Sources Sci. Technol. 10 2001 573 578
- (2001) Plasma Sources Sci. Technol. , vol.10 , pp. 573-578
- Babayan, S.E.¹ Jeong, J.Y.² Schütze, A.³ Tu, V.J.⁴ Moravej, M.⁵ Selwyn, G.S.⁶ Hicks, R.F.⁷

22
- 65449137474
- Y.S. Kim, J.H. Lee, J.T. Lim, J.B. Park, and G.Y. Yeom Thin Solid Films 517 2009 4065 4069
- (2009) Thin Solid Films , vol.517 , pp. 4065-4069
- Kim, Y.S.¹ Lee, J.H.² Lim, J.T.³ Park, J.B.⁴ Yeom, G.Y.⁵

23
- 0028465696
- E.A. Haupfear, E.C. Olson, and L.D. Schmidt J. Electrochem. Soc. 141 1994 1943 1950
- (1994) J. Electrochem. Soc. , vol.141 , pp. 1943-1950
- Haupfear, E.A.¹ Olson, E.C.² Schmidt, L.D.³

24
- 59849113744
- C. Lo, W. Hung, S. Huang, M. De Guzman, V. Rouessac, K. Lee, and J. Lai J. Membr. Sci. 329 2009 138
- (2009) J. Membr. Sci. , vol.329 , pp. 138
- Lo, C.¹ Hung, W.² Huang, S.³ De Guzman, M.⁴ Rouessac, V.⁵ Lee, K.⁶ Lai, J.⁷

25
- 23844466907
- G.R. Nowling, M. Yajima, S.E. Babayan, M. Moravej, X. Yang, W. Hoffman, and R.F. Hicks Plasma Sources Sci. Technol. 14 2005 477 484
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 477-484
- Nowling, G.R.¹ Yajima, M.² Babayan, S.E.³ Moravej, M.⁴ Yang, X.⁵ Hoffman, W.⁶ Hicks, R.F.⁷

26
- 4344675331
- T.K.S. Wong, B. Liu, B. Narayanan, V. Ligatchev, and R. Kuma Thin Solid Films 462 2004 156 160
- (2004) Thin Solid Films , vol.462 , pp. 156-160
- Wong, T.K.S.¹ Liu, B.² Narayanan, B.³ Ligatchev, V.⁴ Kuma, R.⁵

27
- 77950247518
- M. Klevenz, S. Wetzel, M. Moller, and A. Pucci Appl. Spectrosc. 64 2010 298 303
- (2010) Appl. Spectrosc. , vol.64 , pp. 298-303
- Klevenz, M.¹ Wetzel, S.² Moller, M.³ Pucci, A.⁴

28
- 84876152773
- E. Schmachtenberg, and A. Hegenbart Vak. Forsch. Prax. 19 2007 39 43
- (2007) Vak. Forsch. Prax. , vol.19 , pp. 39-43
- Schmachtenberg, E.¹ Hegenbart, A.²

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