Characteristics of monopole antenna plasmas for TEOS PECVD

Thin Solid Films

Volumn 516, Issue 11, 2008, Pages 3605-3609

  Takizawa, K ^a   Mori, Y ^a   Miyatake, N ^a   Murata, K ^a  

^a MITSUI ENGINEERING AND SHIPBUILDING CO LTD   (Japan)

Author keywords

Electron density; Monopole antenna plasma source; PECVD; TEOS

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; OXIDE FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS;

MONOPOLE ANTENNA PLASMA SOURCE; SILICON DIOXIDE FILM;

PLASMA SOURCES;

EID: 40649089414     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.08.029     Document Type: Article

References (15)

1. Sugai H., Ghanashev I., and Nagatsu M. Plasma Sources Sci. Technol. 7 (1998) 192
2. Ide T., Sasaki A., Okamoto T., Azuma K., Nakata Y., Hirano T., and Ando M. Proceedings of The 10th International Display Workshops, Fukuoka, Japan (December 3-5 2003) 1677
3. Murata M., Takeuchi Y., Sasagawa E., and Hamamoto K. Rev. Sci. Instrum. 67 (1996) 1542
4. Yamakoshi H., Satake K., Takeuchi Y., Mashima H., and Aoi T. Appl. Phys. Lett. 88 (2006) 081502
5. Deguchi H., Yoneda H., Kato K., Kubota K., Hayashi T., Ogata K., Ebe A., Takenaka K., and Setsuhara Y. Jpn. J. Appl. Phys. 45 (2006) 8042
6. Takenaka K., Setsuhara Y., Nishisaka K., Ebe A., Sugiura S., Takahashi K., and Ono K. Jpn. J. Appl. Phys. 45 (2006) 8046
7. Murata K., Miyatake N., Mori Y., and Konishi M. Mitsui Zosen Tech. Rev. 186 (2005) 32 (in Japanese)
8. Murata K., Miyatake N., Mori Y., Tachibana H., Uraoka Y., and Fuyuki T. ECS Trans. 3 (2006) 101
9. Kokura H., Nakamura K., Ghanashev I., and Sugai H. Jpn. J. Appl. Phys. 38 (1999) 5262
10. Katsch H.M., Tewes A., Quandt E., Goehlich A., Kawetzki T., and Döbele H.F. J. Appl. Phys. 88 (2000) 6232
11. Lieberman M.A., and Lichtenberg A.J. Principles of Plasma Discharges and Materials Processing (1994), Wiley, New York
12. Morgan W.L., Winstead C., and McKoy V. J. Appl. Phys. 92 (2002) 1663
13. Okimura K., and Maeda N. J. Vac. Sci. Technol., A 16 (1998) 3157
14. Kawahara T., Yuuki A., and Matsui Y. Jpn. J. Appl. Phys. 31 (1992) 2925
15. Vallée C., Rhallabi A., Granier A., Goullet A., and Turban G. J. Vac. Sci. Technol., A 18 (2000) 2728