Ionization in inductively coupled argon plasmas studied by optical emission spectroscopy

Journal of Applied Physics

Volumn 109, Issue 1, 2011, Pages

  Lee, Young Kwang ^a   Chung, Chin Wook ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBED POWER; ARGON PLASMAS; DISCHARGE PRESSURES; EMISSION INTENSITY; EXCITED LEVELS; GROUND-STATE DENSITY; INDUCTIVELY-COUPLED; IONIZATION RATES; METASTABLE FRACTION; MODEL PREDICTION; PRESSURE RANGES;

ARGON; ELECTRIC DISCHARGES; ELECTROMAGNETIC INDUCTION; EMISSION SPECTROSCOPY; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY;

IONIZATION;

EID: 78751562556     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3530578     Document Type: Article

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