Smooth and self-similar SiO2-like films on polymers synthesized in roll-to-roll atmospheric pressure-PECVD for gas diffusion barrier applications

Plasma Processes and Polymers

Volumn 7, Issue 8, 2010, Pages 635-639

  Premkumar, Peter Antony ^a,b   Starostin, Sergey A ^a,b   Creatore, Mariadriana ^a   De Vries, Hindrik ^c   Paffen, Roger M J ^c   Koenraad, Paul M ^a   Van De Sanden, Mauritius C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^c FUJIFILM Manufacturing Europe BV   (Netherlands)

Author keywords

Atmospheric pressure glow discharges (apgd); Films; Gas barriers; Morphology; Organosilicon precursors; Roll to roll reactors; Surface roughness

Indexed keywords

AFM; ATMOSPHERIC PRESSURE GLOW DISCHARGE; DEPOSITION PROCESS; FILM MORPHOLOGY; FILM PROPERTIES; GAS BARRIER; GAS BARRIERS; ORGANO-SILICON PRECURSOR; POLYMERIC SUBSTRATE; REACTIVE GAS; ROLL TO ROLL; ROLL-TO-ROLL MODES; SELF-SIMILAR; SINGLE LAYER;

ATMOSPHERIC PRESSURE; ATMOSPHERICS; FILM GROWTH; GASES; GLOW DISCHARGES; METAL ANALYSIS; MORPHOLOGY; POLYMERIC FILMS; POLYMERS; SILICON COMPOUNDS; SURFACE DISCHARGES; SURFACE MORPHOLOGY; SURFACE PROPERTIES; SURFACE ROUGHNESS;

GAS PERMEABLE MEMBRANES;

EID: 77956257632     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900179     Document Type: Article

References (36)

1. A. G. Erlat, B. C. Wang, R. Spontak, Y. Tropsha, K. D. Mar, D. B. Montgomery, E. A. Vogler, J. Mater. Res. 2000, 15, 704.
2. Y. Leterrier, Prog. Mater. Sci. 2003, 48, 1.
3. B. C. Wang, Y. Tropsha, D. B. Montgomery, E. A. Vogler, R. J. Spontak, J. Mater. Sci. 1999, 18, 311.
4. J. Fahlteich, M. Fahland, W. Schonberger, N. Schiller, Thin Solid Films 2009, 517, 3080.
5. A. G. Erlat, B. M. Henry, C. R. M. Grovenor, A. G. D. Briggs, R. J. Chater, Y. Tsukahara, J. Phys. Chem. B 2004, 108, 883.
6. P. F. Carcia, R. S. McLean, M. D. Groner, A. A. Dameron, S. M. George, J. Appl. Phys. 2009, 106, 023533.
7. A. S. da Silva Sobrinho, M. Latreche, G. Czeremuszkin, J. E. K. Sapieha, M. R. Wertheimer, J. Vac. Sci. Technol, A 1998, 16, 3190.
8. M. Gioti, S. Logothetidis, J. Schroeder, G. Steiniger, Thin Solid Films 2009, 517, 6230.
9. K. A. Seirros, D. A. Cairns, J. S. Abell, S. N. Kukureka, Thin Solid Films 2010, 518, 2623.
10. S. E. Alexandrov, M. L. Hitchman, Chem. Vap. Deposition 2005, 11, 2005.
11. V. Hopfe, D. W. Sheel, Plasma Process. Polym. 2007, 4, 253.
12. A. Chirokov, A. Gutsol, A. Fridman, Pure Appl. Chem. 2005, 77, 487.
13. F. Massines, N. Gherardi, A. Fornelli, S. Martin, Surf. Coat. Technol 2005, 200, 185.
14. F. Fanelli, R. d'Agostino, Plasma Process. Polym. 2007, 4, 797.
15. X. Zhu, F. A. Khonsari, C. P. Etienne, M. Tatoulian, Plasma Process. Polym. 2005, 2, 407.
16. J. Benedikt, V. Raballand, A. Y. Gil, K. Focke, A. von Keudell, Plasma Phys. Control. Fusion 2007, 49, B419.
17. J. Schafer, R. Foest, A. Quade, A. Ohl, K. D. Weltmann, J. Phys. D: Appl. Phys. 2008, 41, 194010.
18. D. Trunec, Z. Navratil, P. Stahel, L. Zajickova, V. Burskova, J. Cech, J. Phys. D: Appl. Phys. 2004, 37, 2112.
19. A. Sonnenfeld, T. M. Tun, L. Zajickova, K. V. Kozlov, H. E. Wagner, J. F. Behnke, R. Hippler, Plasmas Polym. 2001, 6, 237.
20. M. Cernak, L. Cemakova, I. Hudec, D. Kovacik, A. Zahoranova, Eur. Phys. J. Appl. Phys. 2009, 47, 22806.
21. U. Lommatzsch, J. Ihde, Plasma Process. Polym. 2009, 6, 642.
22. M. Thomas, M. Von Hausen, C. P. Klages, P. Baumhof, Plasma Process. Polym. 2007, 4, S465.
23. P. A. Premkumar, S. A. Starostin, H. de Vries, R. M. J. Paffen, M. Creatore, T. Eijkemans, P. M. Koenraad, M. C. M. van de Sanden, Plasma Process. Polym. 2009, 6, 693.
24. S. A. Starostin, P. A. Premkumar, M. Creatore, E. M. van Veldhuizen, H. de Vries, R. Paffen, M. C. M. van de Sanden, Plasma Sources Sci. Technol. 2009, 18, 045021.
25. S. Starostin, E. Aldea, H. de Vries, M. Creatore, M. C. M. van de Sanden, Plasma Process. Polym. 2007, 4, S440.
26. S. A. Starostin, P. A. Premkumar, M. Creatore, H. de Vries, R. Paffen, M. C. M. van de Sanden, Appl. Phys. Lett. 2010, 96, 061502.
27. US2007210721 (2007) Fuji Photo Film B.V., invs.: E. Aldea, J. Bastiaan, M. C. M. van de Sanden, H. de Vries,
28. EP 1626613 A1 (2006) Fuji Photo Film B.V., invs.: H. de Vries, J. Bouwstra, E. Aldea, M. C. M. van de Sanden, P. Peeters,
29. G. Aresta, P. A. Premkumar, S. A. Starostin, H. de Vries, M. C. M. van de Sanden, M. Creatore, Plasma Process. Polym. 2010. DOI: ppap. 200900109.
30. D. S. Wuu, W. C. Lo, C. C. Chiang, H. B. Lin, L. S. Chang, R. H. Horng, C. L. Huang, Y. J. Gao, Surf. Coat. Technol. 2005, 197, 253.
31. A. Y-Gil, J. Cotrino, A. W-Pietrzykowska, A. R. G-Elipe, Phys. Rev. B 2007, 76, 75314.
32. M. Pelliccione, T. M. Lu, "Evolution of Thin Film Morphology, Modelling and Simulations", R. Hull, R. M. Osgood, J. Parisi, H. Warlimont, Eds., Springer-Verlag, Berlin 2008.
33. A. Sonnenfeld, A. Bieder, P. R. von Rohr, Plasma Process. Polym. 2006, 3, 606.
34. A. Francescangeli, F. Palumbo, R. d'Agostino, Plasma Process. Polym. 2008, 5, 770.
35. L. O'Neill, L.-A. O'Hare, S. R. Leadley, A. J. Goodwin, Chem. Vap. Deposition 2005, 11, 477.
36. P. Scopece, A. Viaro, R. Sulcis, I. Kulk, A. Patelli, M. Guglielmi, Plasma Process. Polym. 2009, 6, S705.