Synthesis of silica films on a polymeric material by plasma-enhanced CVD using tetramethoxysilane

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 583-586

  Teshima, Katsuya ^a,b   Inoue, Yasushi ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Organosilane; Plasma enhanced chemical vapor deposition (PECVD); Polyethylene terephthalate (PET) substrates; Silica; Surface morphology

Indexed keywords

AGGLOMERATION; DEPOSITION; FILM GROWTH; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; SYNTHESIS (CHEMICAL); THIN FILMS;

ACTIVE OXYGEN SPECIES;

SILICA;

FILM; SYNTHESIS; VAPOR DEPOSITION;

EID: 0038685816     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00111-7     Document Type: Article

References (14)

1. Batey J. Tierney E. J. Appl. Phys. 60 1986 3136
2. Gokan H. Morimoto A. Murahata M. Thin Solid Films 149 1987 85
3. Ray S.K. Maiti C.K. Lahiri S.K. Chakrabart N.B. J. Vac. Sci. Technol. B 10 1992 1139
4. Deshmukh S.C. Aydil E.S. Appl. Phys. Lett. 65 1994 3185
5. Bogart K.H.A. Dalleska N.F. Fisher E.R. J. Vac. Sci. Technol. A 13 1995 476
6. Goullet A. Vallee C. Granier A. Turban G. J. Vac. Sci. Technol. A 18 2000 2452
7. Rhallabi A. Turban G. J. Vac. Sci. Technol. A 19 2001 743
8. Wrobel A.M. Walkiewicz-Pietrzykowska A. Hatanaka Y. Wickramanayaka S. Nakanishi Y. Chem. Mater. 13 2001 1884
9. Inoue Y. Sugimura H. Takai O. Thin Solid Films 345 1999 90
10. Teshima K. Inoue Y. Sugimura H. Takai O. Thin Solid Films 390 2001 88
11. Teshima K. Inoue Y. Sugimura H. Takai O. Surf. Coat. Technol. 146 2001 451
12. da Silva Sobrinho A.S. Latreche M. Czeremuszkin G. Klemberg-Sapieha J.E. Wertheimer M.R. J. Vac. Sci. Technol. A 16 1998 3190
13. Bergeron A. Klemberg-Sapieha J.E. Martinu L. J. Vac. Sci. Technol. A 16 1998 3227
14. Socrates G. Infrared Characteristic Group Frequencies 1994 Wiley Chichester