Influence of process parameters on the properties of TEOS-PECVD-grown SiO2 films

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 314-318

  Mahajan, A M ^a   Patil, L S ^a   Gautam, D K ^a  

^a NORTH MAHARASHTRA UNIVERSITY   (India)

Author keywords

Film stress; Process parameters; Refractive index; SiO2; TEOS PECVD

Indexed keywords

ELLIPSOMETRY; OPTOELECTRONIC DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; THIN FILMS;

CHAMBER PRESSURE; MASS FLOW RATIO; SILICON DIOXIDE FILMS; TETRAETHOXYSILANE (TEOS);

SILICA;

FILM;

EID: 14644404978     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.051     Document Type: Article

References (18)

1. D.A.P. Bulla N.I. Morimoto Thin Solid Films 334 1998 60
2. Brad Mattson Solid State Technol. 1980 (January) 60
3. Kunio Okimura Naohiro Maeda J. Vac. Sci. Technol., A, Vac. Surf. Films 16 6 1998 3157
4. B. Gorowitz T.B. Gorozyca R.J. Saia Solid State Technol. 1985 (June) 197
5. L. Zajikova I. Ohlidal J. Janca Thin Solid Films 280 1996 26
6. G.B. Raupp T.S. Cale H.P.W. Hey J. Vac. Sci. Technol., B 10 1 1992 37
7. Y.C. Chen M.Z. Yang I.C. Tung M. Chen M.S. Feng H.C. Cheng C.Y. Chang Jpn. J. Appl. Phys. 38 1999 422
8. A.M. Mahajan L.S. Patil J.P. Bange D.K. Gautam J. Optics 31 2002 51
9. A.M. Mahajan, PhD thesis, Fabrication of Plasma enhanced chemical vapor deposition system and growth of thin films using PECVD, North Maharashtra University, Jalgaon, India, Dec. 2002.
10. I.T. Emesh G. D'Asti J.S. Mercier Pak Leung J. Electrochem. Soc. 136 11 1989 3404
11. W.J. Patrick G.C. Schwartz J.D. Chapple-Sokol R. Carruthers K. Olsen J. Electrochem. Soc. 139 9 1992 2604
12. A.M. Mahajan L.S. Patil J.P. Bange D.K. Gautam Surf. Coat. Technol. 183 2004 295
13. S.V. Nguyen D. Doubuzinnsky D. Dopp R. Gleason M. Gibson S. Friedmann Thin Solid Films 193-194 1990 595
14. K. Ramkumar A.N. Saxena J. Electrochem. Soc. 139 5 1992 1437
15. M. Yoshimaru S. Koizumi K. Shimokawa Y. Mori H. Fukuda N. Matsuki J. Vac. Sci. Technol., A, Vac. Surf. Films 17 2 1999 425
16. C.S. Pai C.P. Chang J. Appl. Phys. 68 2 1990 793
17. K. Okimura N. Maeda J. Vac. Sci. Technol., A, Vac. Surf. Films 16 6 1998 3157-3163
18. S.C. Deshmukh E.S. Aydil J. Vac. Sci. Technol., A, Vac. Surf. Films 13 5 1995 2355