Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers

Journal of Physics D: Applied Physics

Volumn 46, Issue 8, 2013, Pages

  Bulusu, A ^a   Kim, H ^a   Samet, D ^a   Graham, S ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; COMPOSITE FILMS; DEIONIZED WATER; II-VI SEMICONDUCTORS; LAMINATED COMPOSITES; METALS; NICKEL OXIDE; OXIDE FILMS; STABILITY; THIN FILMS; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ALUMINA FILMS; AQUEOUS ENVIRONMENT; ATOMIC LAYER DEPOSITED; ATOMIC-LAYER DEPOSITION; BARRIER FILMS; CAPPING LAYER; DEIONISED WATERS; METAL-OXIDE; OXIDE CAPPING LAYERS; TIO;

ATOMIC LAYER DEPOSITION;

EID: 84873930748     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/8/084014     Document Type: Article

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