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Electrochemical and Solid-State Letters

Volumn 13, Issue 5, 2010, Pages

The effects of UV exposure on plasma-enhanced atomic layer deposition ZnO thin film transistor

(6) Lim, S J a Kim, Jae Min b Kim, Doyoung b Lee, Changsoo a Park, Jin Seong c Kim, Hyungjun b

a Pohang University of Science and Technology (POSTECH) (South Korea)

b Yonsei University (South Korea)

c Dankook University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; DEVICE PROPERTIES; GATE VOLTAGES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; UV EXPOSURE; UV LIGHT; UV TREATMENT; ZNO FILMS; ZNO THIN FILM;

CARRIER CONCENTRATION; DEPOSITION; FILM GROWTH; METALLIC FILMS; OPTICAL FILMS; PLASMA DEPOSITION; SEMICONDUCTING ORGANIC COMPOUNDS; THIN FILMS; ZINC OXIDE;

THIN FILM TRANSISTORS;

EID: 77949770418 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3322733 Document Type: Article

Times cited : (15)

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