X-ray photoelectron spectroscopic chemical state Quantification of mixed nickel metal, oxide and hydroxide systems

Surface and Interface Analysis

Volumn 41, Issue 4, 2009, Pages 324-332

  Biesinger, Mark C ^a,b   Payne, Brad P ^b   Lau, Leo W M ^b   Gerson, Andrea ^a   Smart, Roger St C ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

Author keywords

Chemical state quantification; Film thickness; Nickel; Oxides; X ray photoelectron spectroscopy (xps)

Indexed keywords

CHEMICAL STATE QUANTIFICATION; DATA ANALYSIS; HYDROXIDE SYSTEMS; INELASTIC MEAN FREE PATHS; LOW CONCENTRATIONS; MULTIPLET SPLITTING; NICKEL POWDERS; OXYHYDROXIDE; PEAK SHAPES; PLASMON LOSS; RELATIVE SENSITIVITY FACTORS; THIN-FILM ANALYSIS; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); X-RAY PHOTOELECTRONS;

ELECTRON SPECTROSCOPY; ELECTRONS; MAGNETIC FILMS; METAL ANALYSIS; MOLECULAR BEAM EPITAXY; NICKEL; NICKEL ALLOYS; NICKEL OXIDE; OXIDE FILMS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; X RAY ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65349111924     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3026     Document Type: Article

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