The effect of different radio-frequency powers on characteristics of amorphous boron carbon thin film alloys prepared by reactive radio-frequency plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 528, Issue , 2013, Pages 86-92

  Chen, Tsuen Sung ^a   Chiou, Shao En ^a   Shiue, Sham Tsong ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Amorphous boron carbon thin film alloys; Carbon; Chemical vapor deposition; Photovoltaic

Indexed keywords

AMORPHOUS BORON; BUILT-IN VOLTAGE; CARBON BOND; CARBON THIN FILMS; ELECTRICAL RESISTIVITY; FILL FACTOR; GRAPHITIZATION DEGREE; IDEALITY FACTORS; N TYPE SILICON; NATIVE OXIDES; P-TYPE; PHOTOVOLTAIC; POWER CONVERSION EFFICIENCIES; RADIO FREQUENCIES; RADIO-FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RF-PECVD; RF-POWER; SERIES RESISTANCES; THIN FILM ALLOYS;

ALLOYS; AMORPHOUS CARBON; AMORPHOUS SILICON; AUTOMOBILE MANUFACTURE; BORON; CARBON; CHEMICAL VAPOR DEPOSITION; CONVERSION EFFICIENCY; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; FILM PREPARATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON WAFERS; THIN FILMS; TUNGSTEN; VAPORS;

AMORPHOUS ALLOYS;

EID: 84872893130     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.09.091     Document Type: Conference Paper

References (47)

1. J. Robertson Mater. Sci. Eng. R-Rep. 37 2002 129
2. A.M.M. Omer, M. Rusop, S. Adhikari, S. Adhikary, H. Uchida, and M. Umeno Diamond Relat. Mater. 14 2005 1084
3. A.M.M. Omer, S. Adhikari, S. Adhikary, H. Uchida, and M. Umeno Appl. Phys. Lett. 87 2005 161912
4. P.K. Sitch, G. Jungnickel, T. Köhler, T. Frauenheim, and D. Porezag J. Non-Cryst. Solids 227-230 1998 607
5. F.M. Wang, M.W. Chen, and Q.B. Lai Thin Solid Films 518 2010 3332
6. K.M. Krishna, Y. Nukaya, T. Soga, T. Jimbo, and M. Umeno Sol. Energy Mater. Sol. Cells 65 2001 163
7. M. Rusop, X.M. Tian, S.M. Mominuzzaman, T. Soga, T. Jimbo, and M. Umeno Sol. Energy 78 2005 406
8. Z.Q. Ma, and B.X. Liu Sol. Energy Mater. Sol. Cells 69 2001 339
9. T. Soga, T. Kokubu, Y. Hayashi, and T. Jimbo Thin Solid Films 482 2005 86
10. J. Nishinaga, T. Aihara, H. Yamagata, and Y. Horikoshi J. Cryst. Growth 278 2005 633
11. M. Ma, Q. Xue, H. Chen, X. Zhou, D. Xia, C. Lv, and J. Xie Appl. Phys. Lett. 97 2010 061902
12. M. Ma, Q. Xue, J. Li, Y. Zhen, and S. Wang J. Appl. Phys. 110 2011 054503
13. Q. Xue, M. Ma, Y. Zhen, X. Zhou, and S. Wang Diamond Relat. Mater. 21 2012 24
14. C. Wan, X. Zhang, X. Zhang, X. Gao, and X. Tan Appl. Phys. Lett. 95 2009 022105
15. C. Wan, X. Zhang, J. Vanacken, X. Gao, X. Zhang, L. Wu, X. Tan, H. Lin, V.V. Moshchalkov, and J. Yuan Diamond Relat. Mater. 20 2011 26
16. K.M. Krishna, T. Soga, T. Jimbo, and M. Umeno Carbon 37 1999 531
17. J. Podder, M. Rusop, T. Soga, and T. Jimbo Diamond Relat. Mater. 14 2005 1799
18. Y. Hayashi, S. Ishikawa, T. Soga, M. Umeno, and T. Jimbo Diamond Relat. Mater. 12 2003 687
19. S. Adhikari, D.C. Ghimire, H.R. Aryal, S. Adhikary, H. Uchida, and M. Umeno Diamond Relat. Mater. 15 2006 1909
20. J. Han, M. Tan, J. Zhu, S. Meng, B. Wang, S. Mu, and Cao Dawei Appl. Phys. Lett. 90 2007 083508
21. Y. Liu, L. Zhang, L. Cheng, W. Yang, and Y. Xu Appl. Surf. Sci. 255 2009 8761
22. Y. Feng, J. Lv, J. Liu, N. Gao, H. Peng, and Y. Chen Appl. Surf. Sci. 257 2011 3433
23. J.C. Pu, S.F. Wang, C.L. Lin, and J.C. Sung Thin Solid Films 519 2010 521
24. D. Zhang, D.M. Davalle, W.L. O'Brien, and D.N. McIlroy Surf. Sci. 461 2000 16
25. H.C. Lin, S.T. Shiue, and Y.M. Chou Surf. Coat.Technol. 202 2008 5360
26. Y. Liu, L. Zhang, L. Cheng, W. Yang, Y. Xu, and Q. Zeng J. Coat. Technol. Res. 6 2009 509
27. Y. Kawashima, and G. Katagiri Phys. Rev. B 52 1995 10053
28. C. Thomsen, and S. Reich Phys. Rev. Lett. 85 2000 5214
29. L.G. Cancado, M.A. Pimenta, B.R.A. Neves, M.S.S. Dantas, and A. Jorio Phys. Rev. Lett. 93 2004 247401
30. S.T. Shiue, P.Y. Chen, R.H. Lee, T.S. Chen, and H.Y. Lin Surf. Coat.Technol. 205 2010 780
31. T.S. Chen, and S.T. Shiue Thin Solid Films 520 2012 6765
32. J.F. Yu, T.S. Chen, H.C. Lin, and S.T. Shiue Phys. Status Solidi A 207 2010 379
33. A.C. Ferrari, and J. Robertson Phys. Rev. B 61 2000 14095
34. G. Abrasonis, R. Gago, M. Vinnichenko, U. Kreissig, A. Kolitsch, and W. Moller Phys. Rev. B 73 2006 125427
35. T. Heitz, B. Drévillon, C. Godet, and J.E. Bourée Phys. Rev. B 58 1998 13957
36. C.Y. Lin, L.H. Lai, Y.X. Liu, S.T. Shiue, and H.Y. Lin J. Electrochem. Soc. 158 2011 D445
37. H.C. Hsueh, H.C. Li, D. Chiang, and S. Lee J. Electrochem. Soc. 159 2012 D77
38. G.E. Mullenberg Handbook of X-ray Photoelectron Spectroscopy 1979 Perkin Elmer Corporation MN, USA
39. M. Rusop, S.M. Mominuzzaman, T. Soga, T. Jimbo, and M. Umeno J. Phys. Condens. Matter 17 2005 1929
40. J. Hackley, D. Ali, J. DiPasquale, J.D. Demaree, and C.J.K. Richardson Appl. Phys. Lett. 95 2009 133114
41. T. Shirasaki, A. Derré, M. Ménétrier, A. Tressaud, and S. Flandrois Carbon 38 2000 1461
42. J. Tauc, R. Grigorovici, and A. Vancu Phys. Status Solidi B 15 1966 627
43. A. Foulain J. Phys. D: Appl. Phys. 36 2003 394
44. S.N. Das, and A.K. Pal Semicond. Sci. Technol. 21 2006 1557
45. D.P. Norton, M. Ivill, Y. Li, Y.W. Kwon, J.M. Erie, H.S. Kim, K. Ip, S.J. Pearton, Y.W. Heo, S. Kim, B.S. Kang, F. Ren, A.F. Hebard, and J. Kelly Thin Solid Films 496 2006 160
46. S.S. Chen, S.T. Shiue, and W.C. Tang Opt. Eng. 46 2007 035008
47. H.A. Yu, T. Kaneko, S. Yoshimura, Y. Suhng, Y. Sasaki, and S. Otani Appl. Phys. Lett. 69 1996 3042