SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 158, Issue 7, 2011, Pages

Effects of Ammonia addition on thermal chemical vapor deposition rates and microstructures of carbon films

(5) Lin, Chia Ya a Lai, Liang Hsun a Liu, Yu Xian a Shiue, Sham Tsong a Lin, Hung Yi b

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA DISSOCIATION; CARBON ATOMS; CARBON DEPOSITION; DEPOSITION PROCESS; DEPOSITION TEMPERATURES; HYDROGEN ATOMS; RATE INCREASE; RESIDENCE TIME; THERMAL CHEMICAL VAPOR DEPOSITION; WORKING PRESSURES;

ACTIVATION ENERGY; AMMONIA; CHEMICAL VAPOR DEPOSITION; CRYSTALLITE SIZE; DEPOSITION; DEPOSITION RATES; METHANE; MICROSTRUCTURE;

CARBON FILMS;

EID: 79957598972 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3591106 Document Type: Article

Times cited : (9)

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