Effect of rf power on the photovoltaic properties of boron-doped amorphous carbon/n-type silicon junction fabricated by plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 86-89

  Soga, Tetsuo ^a   Kokubu, Toshihide ^a   Hayashi, Yasuhiko ^a   Jimbo, Takashi ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous carbon; Photovoltaic; Plasma enhanced CVD

Indexed keywords

BORON; CARRIER CONCENTRATION; DOPING (ADDITIVES); HYDROGENATION; PHOTOVOLTAIC EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR JUNCTIONS; SILICON;

AMORPHOUS CARBON; ELECTRICAL PROPERTIES; PHOTOVOLATAIC; TRIMETHYLBORON (TMB);

CARBON;

EID: 17744392021     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.123     Document Type: Conference Paper

References (9)

1. K.M. Krishna, M. Umeno, Y. Nukaya, T. Soga, and T. Jimbo Appl. Phys. Lett. 77 2000 1472
2. G.A.J. Amaratunga, V.S. Veerasamy, C.A. Davis, W.I. Milne, D.R. McKenzie, J. Yuan, and M. Weiler J. Non-Cryst. Solids 164-166 1993 1119
3. N. Konofaos, and C.B. Thomas J. Appl. Phys. 81 1997 6238
4. Y.H. Yu, Z.Y. Chen, E.Z. Luo, W.Y. Cheung, J.P. Zhao, X. Wang, J.B. Xu, S.P. Wong, and I.H. Wilson J. Appl. Phys. 87 2000 2874
5. KL. Narayanan, and M. Yamaguchi Appl. Phys. Lett. 75 1999 2106
6. T. Soga Technical Digest of 14th International Photovoltaic Science and Engineering Conference, Bangkok, Thailand 2004 687
7. J. Robertson, and E.P. O'Reilly Phys. Rev., B 35 1987 2946
8. K.M. Krishna, H. Ebisu, K. Hagimoto, Y. Hayashi, T. Soga, T. Jimbo, and M. Umeno Appl. Phys. Lett. 78 2001 294
9. K.M. Krishna, T. Soga, T. Jimbo, and M. Umeno Carbon 37 1999 531