Boron-doped hydrogenated amorphous carbon films grown by surface-wave mode microwave plasma chemical vapor deposition

Diamond and Related Materials

Volumn 15, Issue 11-12 SPEC. ISS., 2006, Pages 1909-1912

  Adhikari, Sudip ^a   Ghimire, Dilip C ^a   Aryal, Hare Ram ^a   Adhikary, Sunil ^b   Uchida, Hideo ^a   Umeno, Masayoshi ^a  

^a CHUBU UNIVERSITY   (Japan)

^b TRIBHUVAN UNIVERSITY   (Nepal)

Author keywords

Amorphous carbon; Boron doped; Optical band gap; Surface wave mode microwave plasma CVD

Indexed keywords

BORON; CARBON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); GROWTH (MATERIALS); PLASMA WAVES; QUARTZ; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON; BORON DOPED; OPTICAL BAND GAP; SURFACE WAVE MODE MICROWAVE PLASMA CVD;

AMORPHOUS FILMS;

EID: 33751265252     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.07.022     Document Type: Article

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