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Volumn 14, Issue 3-7, 2005, Pages 1084-1088
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Photovoltaic characteristics of nitrogen-doped amorphous carbon thin-films grown on quartz and flexible plastic substrates by microwave surface wave plasma CVD
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Author keywords
Amorphous carbon; Microwave surface wave plasma CVD; Nitrogen doping; Photovoltaic characteristics
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Indexed keywords
ARGON;
ELECTRIC CONDUCTANCE;
GROWTH (MATERIALS);
MICROWAVE DEVICES;
PHOTOVOLTAIC EFFECTS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASTICS;
QUARTZ;
SUBSTRATES;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
AMORPHOUS CARBON;
MICROWAVE SURFACE WAVE PLASMA CHEMICAL VAPOR DEPOSITION;
NITROGEN DOPING;
PHOTOVOLTAIC CHARACTERISTICS;
CARBON;
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EID: 18444402239
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2004.12.010 Document Type: Conference Paper |
Times cited : (19)
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References (20)
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