Plasma etch transfer of self-assembled polymer patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8328, Issue , 2012, Pages

  Johnston, Danvers E ^a   Lu, Ming ^a   Black, Charles T ^a  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

atomic layer deposition; etching; hard mask; lithography; lock copolymer; pattern transfer; reactive ion etch; self assembly

Indexed keywords

BLOCK COPOLYMER THIN FILMS; ELECTRONIC MATERIALS; HARD MASKS; INORGANIC MATERIALS; MICROELECTRONICS TECHNOLOGY; PATTERN TRANSFERS; REACTIVE ION ETCH; SELF-ASSEMBLED PATTERNS;

ASPECT RATIO; ATOMIC LAYER DEPOSITION; BLOCK COPOLYMERS; ETCHING; LITHOGRAPHY; MICROELECTRONICS; PHOTORESISTS; SELF ASSEMBLY;

REACTIVE ION ETCHING;

EID: 84872720025     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.920311     Document Type: Conference Paper

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