Fabrication of densely packed, well-ordered, high-aspect-ratio silicon nanopillars over large areas using block copolymer lithography

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 289-294

  Gowrishankar, Vignesh ^a   Miller, Nathaniel ^a   McGehee, Michael D ^a   Misner, Matthew J ^b   Ryu, Du Yeol ^b   Russell, Thomas P ^b   Drockenmuller, Eric ^c   Hawker, Craig J ^c  

^a Stanford University   (United States)

^b UNIVERSITY OF MASSACHUSETTS   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Block copolymer; High aspect ratio; Lift off; Lithography; Nanopillars; Reactive ion etching

Indexed keywords

ANISOTROPY; BLOCK COPOLYMERS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PROCESSING; REACTIVE ION ETCHING; SUBSTRATES;

HIGH-ASPECT-RATIO; LIFT-OFF; NANOPILLARS; PERIODICITY;

SILICON COMPOUNDS;

EID: 33746970959     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.01.064     Document Type: Article

References (19)

1. Halls J.J.M., Walsh C.A., Greenham N.C., Marseglia E.A., Friend R.H., Moratti S.C., and Holmes A.B. Nature 376 (1995) 498
2. Coakley K.M., and McGehee M.D. Chem. Mater. 16 (2004) 4533
3. Johnson S.G., Fan S.H., Villeneuve P.R., Joannopoulos J.D., and Kolodziejski L.A. Phys. Rev., B Condens. Matter (USA) 60 (1999) 5751
4. T.H., Kamp M., Mahnkopf S., Forchel A., Anand S., and Duan G.-H. In: S.L., Busch K., Wehrspohn R.B., and Foll H. (Eds). Photonic Crystals: Advances in Design, Fabrication, and Characterization (2004), John Wiley & Sons 329
5. Ng H.T., Han J., Yamada T., Nguyen P., Chen Y.P., and Meyyappan M. Nano Lett. 4 (2004) 1247
6. Shin K., Leach K.A., Goldbach J.T., Kim D.H., Jho J.Y., Tuominen M., Hawker C.J., and Russell T.P. Nano Lett. 2 (2002) 933
7. Kim D.H., Jia X.Q., Lin Z.Q., Guarini K.W., and Russell T.P. Adv. Mater. 16 (2004) 702
8. Guarini K.W., Black C.T., Milkove K.R., and Sandstrom R.L. J. Vac. Sci. Technol., B 19 (2001) 2784
9. Harrison C., Park M., Chaikin P.M., Register R.A., and Adamson D.H. J. Vac. Sci. Technol., B 16 (1998) 544
10. Li R.R., Dapkus P.D., Thompson M.E., Jeong W.G., Harrison C., Chaikin P.M., Register R.A., and Adamson D.H. Appl. Phys. Lett. (USA) 76 (2000) 1689
11. Cheng J.Y., Ross C.A., Chan V.Z.H., Thomas E.L., Lammertink R.G.H., and Vancso G.J. Adv. Mater. 13 (2001) 1174
12. Cheng J.Y., Ross C.A., Thomas E.L., Smith H.I., and Vancso G.J. Appl. Phys. Lett. (USA) 81 (2002) 3657
13. Temple K., Kulbaba K., Power-Billard K.N., Manners I., Leach K.A., Xu T., Russell T.P., and Hawker C.J. Adv. Mater. 15 (2003) 297
14. Black C.T., Guarini K.W., Milkove K.R., Baker S.M., Russell T.P., and Tuominen M.T. Appl. Phys. Lett. (USA) 79 (2001) 409
15. Liu K., Baker S.M., Tuominen M., Russell T.P., and Schuller I.K. Phys. Rev., B Condens. Matter (USA) 63 (2001) 403
16. Guarini K.W., Black C.T., Zhang Y., Kim H., Sikorski E.M., and Babich I.V. J. Vac. Sci. Technol., B 20 (2002) 2788
17. Huang E., Pruzinsky S., Russell T.P., Mays J., and Hawker C.J. Macromolecules 32 (1999) 5299
18. Huang E., Russell T.P., Harrison C., Chaikin P.M., Register R.A., Hawker C.J., and Mays J. Macromolecules 31 (1998) 7641
19. H. I.-H. Liu, Ph.D. Thesis ("Fabrication and Properties of Silicon Nano-structures"), Department of Electrical Engineering, Stanford University, CA, USA, 1995.