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Volumn 44, Issue 23, 2011, Pages 9196-9204

Impact of out-of-plane translational order in block copolymer lithography

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER DOMAINS; BLOCK COPOLYMER LITHOGRAPHY; BLOCK COPOLYMER THIN FILMS; CORRELATION LENGTHS; FEATURE DIMENSIONS; IN-PLANE; LONG TAIL; ORIENTATIONAL ORDERS; OUT-OF-PLANE; PATTERN TRANSFERS; SELF ASSEMBLED STRUCTURES; SELF-ASSEMBLED; SELF-ASSEMBLED DOMAINS; SIMPLIFIED MODELS; SKEWED DISTRIBUTION; SUBSTRATE INTERFACE; TOP SURFACE;

EID: 82955168982     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma201967a     Document Type: Article
Times cited : (12)

References (33)
  • 5
    • 82955192358 scopus 로고    scopus 로고
    • ITRS International Technology Roadmap for Semiconductors. 2010 Edition. Lithography
    • ITRS International Technology Roadmap for Semiconductors. 2010 Edition. Lithography. http://www.itrs.net/Links/2010ITRS/Home2010.htm


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.