Self assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Black, C T ^a   Ruiz, R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT-HOLE ARRAYS; LAMELLAR-PHASE MATERIALS; SEMICONDUCTOR MICROELECTRONICS; SUB-LITHOGRAPHIC PATTERNING;

ARRAYS; BLOCK COPOLYMERS; INTEGRATED CIRCUITS; PHOTOLITHOGRAPHY; SELF ASSEMBLY; SEMICONDUCTOR MATERIALS; SURFACE PROPERTIES; THIN FILMS; TRANSISTORS;

MICROELECTRONICS;

EID: 33745626842     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659252     Document Type: Conference Paper

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