The role of oxygen and surface reactions in the deposition of silicon oxide like films from HMDSO at atmospheric pressure

Plasma Processes and Polymers

Volumn 9, Issue 11-12, 2012, Pages 1116-1124

  Reuter, Rüdiger ^a   Rügner, Katja ^a   Ellerweg, Dirk ^a   De Los Arcos, Teresa ^a   Von Keudell, Achim ^a   Benedikt, Jan ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Atmospheric pressure; Films; Hexamethyldisiloxane (HMDSO); Silicon oxide; Surface reactions

Indexed keywords

CARBON REMOVAL; COAXIAL GEOMETRY; COAXIAL JET; DEPOSITION PROCESS; EXCITED SPECIES; FREE FILMS; HELIUM GAS; HEXAMETHYL DISILOXANE; METASTABLES; MICRO-PLASMA JET; PLANAR ELECTRODE; ROTATING SUBSTRATES; SPECTROMETRY MEASUREMENTS;

ATMOSPHERIC PRESSURE; CARBON; CARBON FILMS; FILM GROWTH; FILMS; MASS SPECTROMETRY; METAMATERIALS; OXYGEN; PLASMA DEVICES; SILICON OXIDES;

SURFACE REACTIONS;

EID: 84872300853     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100146     Document Type: Article

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