Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge

Journal of Physics D: Applied Physics

Volumn 43, Issue 22, 2010, Pages

  Trunec, D ^a   Zajickova L ^a   Bursikova V ^a   Studnicka F ^a   Stahel P ^a   Prysiazhnyi, V ^b   Perina V ^c   Houdkov, J ^a   Navartil Z ^a   Franta, D ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; CHEMICAL COMPOSITIONS; DEPOSITED FILMS; DEPOSITION PROCESS; DEPTH SENSING INDENTATION; ELASTIC RECOIL DETECTION; ELECTRICAL MEASUREMENT; FILM HARDNESS; HARD THIN FILMS; HEXAMETHYL DISILOXANE; ORGANOSILICON FILMS; POLYCARBONATE SUBSTRATES; RUTHERFORD BACK-SCATTERING; SUBSTRATE TEMPERATURE; VISIBLE RANGE;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DEPOSITION; DIELECTRIC DEVICES; ELECTRIC PROPERTIES; EMISSION SPECTROSCOPY; FLOW CONTROL; INDENTATION; INFRARED SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; OPTICAL PROPERTIES; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 77952867238     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/22/225403     Document Type: Article

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