SCOPUS 정보 검색 플랫폼

Volumn 98, Issue 11, 2011, Pages

Surface reactions as carbon removal mechanism in deposition of silicon dioxide films at atmospheric pressure

Author keywords

[No Author keywords available]

Indexed keywords

A-SPOTS; CARBON CONTENT; CARBON REMOVAL; DEPOSITION PROCESS; LOSS MECHANISMS; MICRO-PLASMA JET; ROTATING SUBSTRATES; SILICON DIOXIDE FILM;

ATMOSPHERIC PRESSURE; CARBON FILMS; GAS MIXTURES; METAMATERIALS; OXYGEN; PLASMA DEPOSITION; PLASMA DEVICES; SILICA; SILICON OXIDES;

SURFACE REACTIONS;

EID: 79952964609 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3565965 Document Type: Article

Times cited : (24)

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