Deposition of SiOx films from O2/HMDSO plasmas

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 1033-1036

  Hegemann, D ^a   Vohrer, U ^a   Oehr, C ^a   Riedel, R ^b  

^a FRAUNHOFER INSTITUTE FOR INTERFACIAL ENGINEERING AND BIOTECHNOLOGY IGB   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Adhesion; R.f. plasma; SiOx films

Indexed keywords

ADHESION; COMPOSITION EFFECTS; DEPOSITION; OXYGEN; PLASMA APPLICATIONS; PROTECTIVE COATINGS; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

HEXAMETHYLDISILOXANE; PLASMA REACTORS; SCRATCH RESISTANCE;

SILICA;

EID: 0033335422     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00092-4     Document Type: Article

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