Deposition of silicon dioxide films using an atmospheric pressure microplasma jet

Journal of Applied Physics

Volumn 105, Issue 8, 2009, Pages

  Raballand, V ^a   Benedikt, J ^a   Hoffmann, S ^a   Zimmermann, M ^a   Von Keudell, A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HEXAMETHYL DISILOXANE; INORGANIC FILMS; MICRO-PLASMA JETS; PLASMA FORMING GAS; ROOM TEMPERATURES; SILICON DIOXIDE FILMS; TETRAMETHYL SILANES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ARGON; ATMOSPHERIC PRESSURE; CARBON FILMS; FLOW RATE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL ELECTRIC STIMULATION; OXYGEN; PLASMA DEVICES; PLASMA DISPLAY DEVICES; POLYMERS; SILICA; SILICON OXIDES; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65449189103     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3108541     Document Type: Article

References (30)

1. A. Sonnenfeld, T. M. Tun, L. Zakickova, K. Kozlov, H. -E. Wagner, J. F. Behnke, and R. Hippler, Plasmas Polym. 1084-0184 10.1023/A:1014414016164 6, 237 (2001).
2. S. E. Alexandrov, N. McSporran, and M. L. Hitchman, Chem. Vap. Deposition 0948-1907 10.1002/cvde.200506385 11, 481 (2005).
3. F. Massines, N. Gheradi, A. Fornelliand, and S. Martin, Surf. Coat. Technol. 0257-8972 10.1016/j.surfcoat.2005.08.010, 200: 1855, 2005.
4. S. Starostine, E. Aldea, H. de Vries, M. Creatore, and M. C. M. van de Sanden, Plasma Processes Polym. 1612-8850 10.1002/ppap.200731203 4, S440 (2007).
5. Y. Sawada, S. Ogawa, and M. Kogoma, J. Phys. D 0022-3727 10.1088/0022-3727/28/8/015 28, 1661 (1995).
6. G. R. Nowling, M. Yajima, S. E. Babayan, M. Moravej, X. Yang, W. Hoffman, and R. F. Hicks, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/3/ 009 14, 477 (2005).
7. S. Martin, F. Massines, N. Gherardi, and C. Jimenez, Surf. Coat. Technol. 177-178, 693 (2004). 0257-8972
8. N. Jidenko, C. Jimenez, F. Massines, and J. P. Borra, J. Phys. D 0022-3727 10.1088/0022-3727/40/14/009 40, 4155 (2007).
9. Y. Shimizu, T. Sasaki, T. Ito, K. Terashima, and N. Koshizaki, J. Phys. D 0022-3727 10.1088/0022-3727/36/23/011 36, 2940 (2003).
10. I. Enache, H. Caquineau, N. Gherardi, T. Paulmier, L. Maechler, and F. Massines, Plasma Processes Polym. 1612-8850 10.1002/ppap.200700073 4, 806 (2007).
11. R. M. Sankaran and K. P. Giapis, J. Phys. D 0022-3727 10.1088/0022-3727/36/23/008 36, 2914 (2003).
12. K. Inomata, H. Ha, K. A. Chaudhary, and H. Koinuma, Appl. Phys. Lett. 0003-6951 10.1063/1.110916 64, 46 (1994).
13. S. E. Babayan, J. Y. Jeong, A. Schütze, V. J. Tu, M. Moravej, G. S. Selwyn, and R. F. Hicks, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/10/4/305 10, 573 (2001).
14. J. Y. Jeong, S. E. Babayan, A. Schütze, V. J. Tu, M. Morajev, G. S. Selwyn, and R. F. Hicks, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/7/3/005 7, 282 (1998).
15. V. Raballand, J. Benedikt, and A. von Keudell, Appl. Phys. Lett. 0003-6951 10.1063/1.2844880 92, 091502 (2008).
16. A. Yanguas-Gil, K. Focke, J. Benedikt, and A. von Keudell, J. Appl. Phys. 0021-8979 10.1063/1.2714646 101, 103307 (2007).
17. J. Benedikt, K. Focke, A. Yanguas-Gil, and A. von Keudell, Appl. Phys. Lett. 0003-6951 10.1063/1.2423233 89, 251504 (2006).
18. J. Benedikt, V. Raballand, A. Yanguas-Gil, K. Focke, and A. von Keudell, Plasma Phys. Controlled Fusion 0741-3335 10.1088/0741-3335/49/12B/S39 49, B419 (2007).
19. P. G. Pai, S. S. Chao, Y. Tagaki, and G. G. Lucovsky, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.573833 4, 689 (1986).
20. W. A. Pliskin, J. Vac. Sci. Technol. 0022-5355 10.1116/1.569413 14, 1064 (1977).
21. J. A. Theil, D. V. Tsu, M. W. Watkins, S. S. Kim, and G. Lucovsky, J. Vac. Sci. Technol. 8, 1374 (1990). 0022-5355
22. G. Borvon, A. Goullet, A. Granier, and G. Turban, Plasmas Polym. 1084-0184 10.1023/A:1021381003259 7, 341 (2002).
23. K. Aumaille, C. Vallee, A. Granier, A. Goullet, F. Gaboriau, and G. Turban, Thin Solid Films 0040-6090 10.1016/S0040-6090(99)00883-4 359, 188 (2000).
24. M. F. A. M. van Hest, B. Mitu, D. C. Schram, and M. C. M. van de Sanden, Thin Solid Films 0040-6090 10.1016/S0040-6090(03)01398-1 449, 52 (2004).
25. R. A. B. Devine, R. Dupree, I. Farman, and J. J. Capponi, Phys. Rev. B 0163-1829 10.1103/PhysRevB.35.2560 35, 2560 (1987).
26. C. Q. Jiao, C. A. DeJoseph, and A. Garscadden, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1953669 23, 1295 (2005).
27. M. Creatore, J. -C. Cigal, G. M. W. Kroesen, and M. C. M. van de Sanden, Thin Solid Films 0040-6090 10.1016/j.tsf.2005.02.015 484, 104 (2005).
28. H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, Vacuum 0042-207X 10.1016/S0042-207X(01)00350-5 63, 385 (2001).
29. A. von Keudell and W. Jacob, Prog. Surf. Sci. 0079-6816 10.1016/j.progsurf.2004.05.001 76, 21 (2004).
30. D. Ellerweg, J. Benedikt, and A. von Keudell (unpublished).