Remote AP-PECVD of silicon dioxide films from hexamethyldisiloxane (HMDSO)

Chemical Vapor Deposition

Volumn 11, Issue 11-12, 2005, Pages 481-490

  Alexandrov, Sergei E ^a   McSporran, Neil ^b   Hitchman, Michael L ^b  

^a PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

^b UNIVERSITY OF STRATHCLYDE   (United Kingdom)

Author keywords

Atmospheric pressure CVD; Plasma enhanced CVD; Silicon dioxide

Indexed keywords

ATMOSPHERIC PRESSURE; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; REFRACTIVE INDEX; SILICA;

ATMOSPHERIC PRESSURE CVD; DIELECTRIC BARRIER DISCHARGES; SILICON OXIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 29944445827     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200506385     Document Type: Article

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