Metal-organic framework ZIF-8 films as low-κ dielectrics in microelectronics

Chemistry of Materials

Volumn 25, Issue 1, 2013, Pages 27-33

  Eslava, Salvador ^a   Zhang, Liping ^b   Esconjauregui, Santiago ^c   Yang, Junwei ^c   Vanstreels, Kris ^b   Baklanov, Mikhail R ^b   Saiz, Eduardo ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b IMEC   (Belgium)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

dielectric; interconnects; low k; metal organic frameworks; porous co ordination polymers

Indexed keywords

CHIP-MANUFACTURING; COORDINATION POLYMERS; DIFFERENT FREQUENCY; IMPEDANCE ANALYSIS; INTERGRANULAR; LOW-K; METAL ORGANIC FRAMEWORK; MICROELECTRONIC CHIP; POLARIZABILITIES; TAPE TESTS; VOLTAGE CURVE;

COALESCENCE; CRYSTALLINE MATERIALS; ELECTRIC INSULATORS; GAS ADSORPTION; METALS; MICROELECTRONICS; OPTICAL INTERCONNECTS; ORGANIC POLYMERS; RIGIDITY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY;

DIELECTRIC MATERIALS;

EID: 84872136032     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm302610z     Document Type: Conference Paper

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